Inventor · disambiguated record
Manfred Maul
Also filed as: MAUL MANFRED
66 granted patents·13 pending applications·521 citations·filing 1992–2018
99Inventor score
Files withZEISS CARL SMT GMBH29ZEISS CARL SMT AG23FIOLKA DAMIAN4MAUL MANFRED3CARL ZEISS SMART OPTICS GMBH2
Top patents by PatentIndex Score
79 records- 0197US6535273B1Microlithographic illumination system with depolarizerZEISS STIFTUNG·Filed 2001·Granted Mar 18, 2003·99 cites·9 claims
- 0296US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0395US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0494US7233386B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2005·Granted Jun 19, 2007·16 cites·33 claims
- 0594US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 0692US8811568B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2013·Granted Aug 19, 2014·5 cites·24 claims
- 0791US7714983B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2004·Granted May 11, 2010·38 cites·35 claims
- 0891US6728043B2Microlithographic illumination method and a projection lens for carrying out the methodZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 27, 2004·44 cites·53 claims
- 0989US7995280B2Projection exposure system, beam delivery system and method of generating a beam of lightZEISS CARL SMT GMBH·Filed 2005·Granted Aug 9, 2011·14 cites·9 claims
- 1088US7570345B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2007·Granted Aug 4, 2009·7 cites·4 claims
- 1188US7408622B2Illumination system and polarizer for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·27 cites·71 claims
- 1288US6879379B2Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2003·Granted Apr 12, 2005·27 cites·51 claims
- 1387US8724086B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationLAYH MICHAEL·Filed 2010·Granted May 13, 2014·4 cites·24 claims
- 1485US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 1584US9280060B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·5 cites·28 claims
- 1683US7875865B2EUV illumination system with a system for measuring fluctuations of the light sourceZEISS CARL SMT AG·Filed 2008·Granted Jan 25, 2011·9 cites·29 claims
- 1782US10444631B2Method of operating a microlithographic projection apparatus and illumination system of such an apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Oct 15, 2019·2 cites·22 claims
- 1882US8004656B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2006·Granted Aug 23, 2011·5 cites·18 claims
- 1980US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 2079US8760744B2Correction of optical elements by correction light irradiated in a flat mannerBLEIDISTEL SASCHA·Filed 2009·Granted Jun 24, 2014·3 cites·27 claims
- 2178US8891057B2Microlithographic projection exposure apparatusLAYH MICHAEL·Filed 2010·Granted Nov 18, 2014·2 cites·21 claims
- 2278US8873023B2Illumination system for microlithographySCHOLZ AXEL·Filed 2011·Granted Oct 28, 2014·4 cites·12 claims
- 2377US7126765B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Oct 24, 2006·3 cites·14 claims
- 2476US9964856B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted May 8, 2018·2 cites·20 claims
- 2576US8025427B2Filter device for the compensation of an asymmetric pupil illuminationZEISS CARL SMT GMBH·Filed 2010·Granted Sep 27, 2011·2 cites·21 claims
- 2674US8264668B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2009·Granted Sep 11, 2012·5 cites·16 claims
- 2774US8068279B2Optical system of an illumination device of a projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2007·Granted Nov 29, 2011·10 cites·39 claims
- 2873US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 2973US8928859B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2012·Granted Jan 6, 2015·2 cites·20 claims
- 3071US8513628B2EUV illumination system with a system for measuring fluctuations of the light sourceSCHOLZ AXEL·Filed 2010·Granted Aug 20, 2013·2 cites·21 claims
- 3170US9955563B2EUV light source for generating a usable output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 24, 2018·2 cites·20 claims
- 3270US9606441B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 28, 2017·1 cites·20 claims
- 3369US9766553B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2015·Granted Sep 19, 2017·1 cites·18 claims
- 3469US9217930B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·1 cites·25 claims
- 3568US8395756B2Illumination system for a microlithographic projection exposure apparatusWANGLER JOHANNES·Filed 2008·Granted Mar 12, 2013·2 cites·49 claims
- 3667US8480261B2Filter device for the compensation of an asymmetric pupil illuminationMAUL MANFRED·Filed 2012·Granted Jul 9, 2013·1 cites·21 claims
- 3767US7798676B2Filter device for the compensation of an asymmetric pupil illuminationZEISS CARL SMT AG·Filed 2005·Granted Sep 21, 2010·2 cites·26 claims
- 3866US9170499B2Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 27, 2015·1 cites·20 claims
- 3966US9052606B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Jun 9, 2015·1 cites·19 claims
- 4066US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 4165US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 4263US9366857B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2014·Granted Jun 14, 2016·0 cites·21 claims
- 4362US7593095B2System for reducing the coherence of laser radiationZEISS CARL SMT AG·Filed 2005·Granted Sep 22, 2009·1 cites·49 claims
- 4461US2014211188A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 4560US10054786B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2016·Granted Aug 21, 2018·0 cites·23 claims
- 4660US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 4760US7180667B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Feb 20, 2007·4 cites·56 claims
- 4858US10247949B2Method for adjusting a display deviceCARL ZEISS SMART OPTICS GMBH·Filed 2015·Granted Apr 2, 2019·1 cites·10 claims
- 4958US8636386B2Filter device for the compensation of an asymmetric pupil illuminationZEISS CARL SMT GMBH·Filed 2013·Granted Jan 28, 2014·0 cites·20 claims
- 5058US7031069B2Microlithographic illumination method and a projection lens for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Apr 18, 2006·5 cites·81 claims
Showing the top 50 of 79 patent records by PatentIndex Score.
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