Inventor · disambiguated record
Joo-Tae Moon
Also filed as: MOON JOO-TAE
10 granted patents·1 pending application·178 citations·filing 1998–2009
90Inventor score
Files withSAMSUNG ELECTRONICS CO LTD10
Top patents by PatentIndex Score
11 records- 0192US6485895B1Methods for forming line patterns in semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 26, 2002·55 cites·25 claims
- 0286US6844134B2Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 18, 2005·26 cites·50 claims
- 0378US6803176B2Methods for forming line patterns in semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Oct 12, 2004·17 cites·48 claims
- 0468US6964839B1Photosensitive polymer having cyclic backbone and resist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 15, 2005·22 cites·16 claims
- 0563US8013374B2Semiconductor memory devices including offset bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·2 cites·16 claims
- 0659US6169009B1Methods of etching platinum group metal film and forming lower electrode of capacitorSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jan 2, 2001·25 cites·6 claims
- 0755US7547936B2Semiconductor memory devices including offset active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 16, 2009·1 cites·19 claims
- 0852US6245482B1Polymer and chemically amplified resist composition including silicon containing protecting groupSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jun 12, 2001·2 cites·6 claims
- 0951US6284438B1Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 4, 2001·16 cites·21 claims
- 1051US6051362ASilicon containing polymer and chemically amplified resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Apr 18, 2000·12 cites·14 claims
- 1143US2005026078A1Resist compositions including thermal crosslinking agentsFiled 2004·Application pending·0 cites
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