Inventor · disambiguated record
Paul Ijmert Scheffers
Also filed as: SCHEFFERS PAUL IJMERT
7 granted patents·2 pending applications·11 citations·filing 2012–2024
76Inventor score
Top patents by PatentIndex Score
9 records- 0183US9829804B1Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted Nov 28, 2017·4 cites·31 claims
- 0280US9653259B2Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatusMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 16, 2017·5 cites·17 claims
- 0371US9665014B2Charged particle lithography system with alignment sensor and beam measurement sensorMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 30, 2017·2 cites·18 claims
- 0456US2025095950A1Electron-optical deviceASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0554USRE49732ECharged particle lithography system with alignment sensor and beam measurement sensorASML NETHERLANDS BV·Filed 2013·Granted Nov 21, 2023·0 cites·30 claims
- 0652USRE49483EMethod for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatusASML NETHERLANDS BV·Filed 2013·Granted Apr 4, 2023·0 cites·20 claims
- 0749US9153415B2Charged particle lithography system with sensor assemblyMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Oct 6, 2015·0 cites·25 claims
- 0842US9240306B2Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a deviceMAPPER LITHOGRAPHY IP BV·Filed 2012·Granted Jan 19, 2016·0 cites·37 claims
- 0934US2018033586A1Apparatus and method for processing or imaging a sampleMAPPER LITHOGRAPHY IP BV·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →