Inventor · disambiguated record
Seong-Yong Moon
Also filed as: MOON SEONG-YONG
8 granted patents·1 pending application·93 citations·filing 1996–2014
86Inventor score
Files withSAMSUNG ELECTRONICS CO LTD8
Top patents by PatentIndex Score
9 records- 0180US7560198B2Photo-mask having exposure blocking region and methods of designing and fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jul 14, 2009·6 cites·37 claims
- 0278US5741613AMethods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputteringSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Apr 21, 1998·44 cites·14 claims
- 0364US6566275B1Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted May 20, 2003·11 cites·8 claims
- 0457US7369254B2System and method for measuring dimension of patterns formed on photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted May 6, 2008·3 cites·17 claims
- 0554US9229327B2Electron beam exposure apparatus and method of detecting error using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 5, 2016·0 cites·10 claims
- 0653US5853921AMethods of fabricating phase shift masks by controlling exposure dosesSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Dec 29, 1998·15 cites·20 claims
- 0739US5804338APhotolithography masks including phase-shifting layers and related methods and structuresSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Sep 8, 1998·7 cites·16 claims
- 0837US6296975B1Photo mask of semiconductor device and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Oct 2, 2001·7 cites·14 claims
- 0937US2005140988A1Optical critical dimension measurement equipmentFiled 2004·Application pending·0 cites
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