Inventor · disambiguated record
James Welch
Also filed as: WELCH JAMES · WELCH JAMES J
11 granted patents·3 pending applications·1,591 citations·filing 2002–2011
93Inventor score
Top patents by PatentIndex Score
14 records- 0198US7475588B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Jan 13, 2009·474 cites·64 claims
- 0298US7296460B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Nov 20, 2007·481 cites·23 claims
- 0398US7080545B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2002·Granted Jul 25, 2006·495 cites·81 claims
- 0494US7285308B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumADVANCED TECH MATERIALS·Filed 2004·Granted Oct 23, 2007·45 cites·79 claims
- 0590US8304344B2High throughput chemical mechanical polishing composition for metal film planarizationBOGGS KARL E·Filed 2008·Granted Nov 6, 2012·26 cites·18 claims
- 0685US8034407B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumADVANCED TECH MATERIALS·Filed 2007·Granted Oct 11, 2011·4 cites·16 claims
- 0782US7296458B2Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using sameADVANCED TECH MATERIALS·Filed 2004·Granted Nov 20, 2007·21 cites·38 claims
- 0882US7228724B2Apparatus and process for sensing target gas species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2004·Granted Jun 12, 2007·19 cites·41 claims
- 0980US7370511B1Gas sensor with attenuated drift characteristicMST TECHNOLOGY GMBH·Filed 2004·Granted May 13, 2008·18 cites·50 claims
- 1078US8109130B2Apparatus and process for sensing fluoro species in semiconductor processing systemsDIMEO JR FRANK·Filed 2009·Granted Feb 7, 2012·8 cites·22 claims
- 1158US8241704B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumHENDRIX BRYAN C·Filed 2011·Granted Aug 14, 2012·0 cites·15 claims
- 1249US2008134757A1Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing FacilityADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1341US2009215269A1Integrated chemical mechanical polishing composition and process for single platen processingADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1440US2004163445A1Apparatus and process for sensing fluoro species in semiconductor processing systemsFiled 2004·Application pending·0 cites
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