Inventor · disambiguated record
Kurt K. Christenson
Also filed as: CHRISTENSON KURT · CHRISTENSON KURT K · CHRISTENSON KURT KARL
21 granted patents·8 pending applications·475 citations·filing 1997–2022
96Inventor score
Top patents by PatentIndex Score
29 records- 0195US12172444B2High reliability sheathed transport path for aerosol jet devicesOPTOMEC INC·Filed 2022·Granted Dec 24, 2024·2 cites·14 claims
- 0292US7476616B2Reagent activator for electroless platingFSI INT INC·Filed 2005·Granted Jan 13, 2009·17 cites·16 claims
- 0391US5971368ASystem to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilizedFSI INT INC·Filed 1997·Granted Oct 26, 1999·121 cites·14 claims
- 0488US7592264B2Process for removing material from substratesFSI INT INC·Filed 2006·Granted Sep 22, 2009·13 cites·43 claims
- 0586US6648307B2Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilizedFSI INT INC·Filed 2002·Granted Nov 18, 2003·50 cites·10 claims
- 0684US6875289B2Semiconductor wafer cleaning systems and methodsFSI INT INC·Filed 2002·Granted Apr 5, 2005·37 cites·14 claims
- 0782US10850510B2Shuttering of aerosol streamsOPTOMEC INC·Filed 2019·Granted Dec 1, 2020·2 cites·11 claims
- 0881US10632746B2Shuttering of aerosol streamsOPTOMEC INC·Filed 2018·Granted Apr 28, 2020·2 cites·22 claims
- 0981US7364625B2Rinsing processes and equipmentFSI INT INC·Filed 2002·Granted Apr 29, 2008·31 cites·10 claims
- 1077US8394228B2Apparatus for removing material from one or more substratesCHRISTENSON KURT KARL·Filed 2009·Granted Mar 12, 2013·6 cites·13 claims
- 1177US6835667B2Method for etching high-k films in solutions comprising dilute fluoride speciesFSI INT INC·Filed 2002·Granted Dec 28, 2004·24 cites·34 claims
- 1276US6235641B1Method and system to control the concentration of dissolved gas in a liquidFSI INTERNAT INC·Filed 1998·Granted May 22, 2001·50 cites·32 claims
- 1373US6406551B1Method for treating a substrate with heat sensitive agentsFSI INT INC·Filed 1999·Granted Jun 18, 2002·42 cites·23 claims
- 1472US8859435B2Process for removing material from substratesTEL FSI INC·Filed 2012·Granted Oct 14, 2014·2 cites·3 claims
- 1572US6274506B1Apparatus and method for dispensing processing fluid toward a substrate surfaceFSI INT INC·Filed 1999·Granted Aug 14, 2001·39 cites·22 claims
- 1664US6488271B1Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilizedFSI INT INC·Filed 1999·Granted Dec 3, 2002·22 cites·30 claims
- 1762US8235068B2Substrate processing systems and related methodsCHRISTENSON KURT K·Filed 2009·Granted Aug 7, 2012·2 cites·20 claims
- 1860US2024246290A13d printing using rapid tilting of a jet deposition nozzleOPTOMEC INC·Filed 2022·Application pending·0 cites
- 1958US8142571B2Process for treatment of semiconductor wafer using water vapor containing environmentCHRISTENSON KURT K·Filed 2009·Granted Mar 27, 2012·1 cites·14 claims
- 2058US7156927B2Transition flow treatment process and apparatusFSI INT INC·Filed 2002·Granted Jan 2, 2007·10 cites·32 claims
- 2154US8104425B2Reagent activator for electroless platingCHRISTENSON KURT KARL·Filed 2008·Granted Jan 31, 2012·0 cites·9 claims
- 2253US2007151576A1Treatment systems and methodsCHRISTENSON KURT K·Filed 2007·Application pending·0 cites
- 2349US7425505B2Use of silyating agentsFSI INT INC·Filed 2004·Granted Sep 16, 2008·2 cites·30 claims
- 2445US2009304995A1Hydrophilic fluoropolymer materials and methodsFSI INT INC·Filed 2009·Application pending·0 cites
- 2543US2004050408A1Treatment systems and methodsFiled 2002·Application pending·0 cites
- 2640US2005072625A1Acoustic diffusers for acoustic field uniformityFiled 2004·Application pending·0 cites
- 2740US2005098194A1Semiconductor wafer immersion systems and treatments using modulated acoustic energyFiled 2004·Application pending·0 cites
- 2837US2006070979A1Using ozone to process wafer like objectsCHRISTENSON KURT K·Filed 2005·Application pending·0 cites
- 2935US2002173166A1Method and apparatus to quickly increase the concentration of gas in a process chamber to a very high levelFiled 2001·Application pending·0 cites
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