Inventor · disambiguated record
Paul Schilling
Also filed as: SCHILLING PAUL · SCHILLING PAUL E
12 granted patents·6 pending applications·345 citations·filing 1997–2005
92Inventor score
Files withTOKYO ELECTRON LTD9ALLIED SIGNAL INC2SUPERCRITICAL SYSTEMS INC2HONEYWELL INT INC1SUPERCRITICAL SYSEMS INC1
Top patents by PatentIndex Score
18 records- 0195US6500605B1Removal of photoresist and residue from substrate using supercritical carbon dioxide processTOKYO ELECTRON LTD·Filed 2000·Granted Dec 31, 2002·128 cites·35 claims
- 0290US6890853B2Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning moduleTOKYO ELECTRON LTD·Filed 2001·Granted May 10, 2005·46 cites·45 claims
- 0384US6270395B1Oxidizing polishing slurries for low dielectric constant materialsALLIED SIGNAL INC·Filed 1998·Granted Aug 7, 2001·64 cites·18 claims
- 0477US6124421APoly(arylene ether) compositions and methods of manufacture thereofALLIED SIGNAL INC·Filed 1997·Granted Sep 26, 2000·53 cites·45 claims
- 0574US6610114B2Oxidizing polishing slurries for low dielectric constant materialsHONEYWELL INT INC·Filed 2001·Granted Aug 26, 2003·15 cites·27 claims
- 0673US6924086B1Developing photoresist with supercritical fluid and developerTOKYO ELECTRON LTD·Filed 2003·Granted Aug 2, 2005·7 cites·22 claims
- 0771US6928746B2Drying resist with a solvent bath and supercritical CO2TOKYO ELECTRON LTD·Filed 2003·Granted Aug 16, 2005·18 cites·26 claims
- 0864US7270941B2Method of passivating of low dielectric materials in wafer processingTOKYO ELECTRON LTD·Filed 2003·Granted Sep 18, 2007·9 cites·24 claims
- 0959US7169540B2Method of treatment of porous dielectric films to reduce damage during cleaningTOKYO ELECTRON LTD·Filed 2003·Granted Jan 30, 2007·4 cites·28 claims
- 1058US7044662B2Developing photoresist with supercritical fluid and developerTOKYO ELECTRON LTD·Filed 2004·Granted May 16, 2006·1 cites·22 claims
- 1144US7399708B2Method of treating a composite spin-on glass/anti-reflective material prior to cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Jul 15, 2008·0 cites·21 claims
- 1244US2004231707A1Decontamination of supercritical wafer processing equipmentFiled 2003·Application pending·0 cites
- 1343US7208411B2Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning moduleTOKYO ELECTRON LTD·Filed 2004·Granted Apr 24, 2007·0 cites·25 claims
- 1439US2005227187A1Ionic fluid in supercritical fluid for semiconductor processingSUPERCRITICAL SYSTEMS INC·Filed 2005·Application pending·0 cites
- 1539US2004072706A1Removal of contaminants using supercritical processingFiled 2003·Application pending·0 cites
- 1636US2004192172A1Oxidizing polishing slurries for low dielectric constant materialsFiled 2003·Application pending·0 cites
- 1736US2004112409A1Fluoride in supercritical fluid for photoresist and residue removalSUPERCRITICAL SYSEMS INC·Filed 2002·Application pending·0 cites
- 1836US2004177867A1Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removalSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
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