Inventor · disambiguated record
Neal Callan
Also filed as: CALLAN NEAL · CALLAN NEAL P · CALLAN NEAL PATRICK
22 granted patents·3 pending applications·198 citations·filing 2002–2024
95Inventor score
Top patents by PatentIndex Score
25 records- 0196US9507907B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2015·Granted Nov 29, 2016·18 cites·20 claims
- 0294US10579772B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2018·Granted Mar 3, 2020·7 cites·20 claims
- 0394US9990462B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2016·Granted Jun 5, 2018·8 cites·21 claims
- 0490US11080459B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2020·Granted Aug 3, 2021·2 cites·20 claims
- 0588US6775818B2Device parameter and gate performance simulation based on wafer image predictionLSI LOGIC CORP·Filed 2002·Granted Aug 10, 2004·57 cites·26 claims
- 0688US2024403537A1Computational wafer inspectionASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0782US6782525B2Wafer process critical dimension, alignment, and registration analysis simulation toolLSI LOGIC CORP·Filed 2002·Granted Aug 24, 2004·23 cites·20 claims
- 0877US12067340B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2021·Granted Aug 20, 2024·0 cites·23 claims
- 0977US7499146B2Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cuppingASML NETHERLANDS BV·Filed 2005·Granted Mar 3, 2009·4 cites·19 claims
- 1076US6864020B1Chromeless phase shift mask using non-linear optical materialsLSI LOGIC CORP·Filed 2002·Granted Mar 8, 2005·13 cites·20 claims
- 1173US7313508B2Process window compliant corrections of design layoutLSI CORP·Filed 2002·Granted Dec 25, 2007·13 cites·25 claims
- 1272US9188848B2Maskless vortex phase shift optical direct write lithographyAVAGO TECHNOLOGIES GENERAL IP·Filed 2012·Granted Nov 17, 2015·1 cites·23 claims
- 1371US7189498B2Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography processLSI LOGIC CORP·Filed 2004·Granted Mar 13, 2007·11 cites·23 claims
- 1466US7372547B2Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithographyLSI CORP·Filed 2004·Granted May 13, 2008·8 cites·41 claims
- 1563US8015540B2Method and system for reducing inter-layer capacitance in integrated circuitsLSI CORP·Filed 2008·Granted Sep 6, 2011·2 cites·6 claims
- 1661US7005217B2Chromeless phase shift maskLSI LOGIC CORP·Filed 2003·Granted Feb 28, 2006·6 cites·20 claims
- 1758US7149340B2Mask defect analysis for both horizontal and vertical processing effectsLSI LOGIC CORP·Filed 2002·Granted Dec 12, 2006·12 cites·26 claims
- 1856US8377633B2Maskless vortex phase shift optical direct write lithographyLSI CORP·Filed 2011·Granted Feb 19, 2013·0 cites·10 claims
- 1955US7270942B2Optimized mirror design for optical direct writeLSI CORP·Filed 2004·Granted Sep 18, 2007·4 cites·4 claims
- 2052US7396760B2Method and system for reducing inter-layer capacitance in integrated circuitsLSI CORP·Filed 2004·Granted Jul 8, 2008·4 cites·19 claims
- 2149US7738078B2Optimized mirror design for optical direct writeLSI CORP·Filed 2007·Granted Jun 15, 2010·0 cites·10 claims
- 2244US7376260B2Method for post-OPC multi layer overlay quality inspectionLSI LOGIC CORP·Filed 2004·Granted May 20, 2008·4 cites·21 claims
- 2343US8057963B2Maskless vortex phase shift optical direct write lithographyEIB NICHOLAS K·Filed 2004·Granted Nov 15, 2011·1 cites·26 claims
- 2439US2005151949A1Process and apparatus for applying apodization to maskless optical direct write lithography processesLSI LOGIC CORP·Filed 2004·Application pending·0 cites
- 2536US2005019673A1Attenuated film with etched quartz phase shift maskFiled 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →