Inventor · disambiguated record
Linda Karin Sundberg
Also filed as: SUNDBERG LINDA · SUNDBERG LINDA K · SUNDBERG LINDA KARIN
47 granted patents·6 pending applications·413 citations·filing 2005–2024
98Inventor score
Top patents by PatentIndex Score
53 records- 0199US7521090B1Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Apr 21, 2009·158 cites·25 claims
- 0295US8703386B2Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applicationsBASS JOHN DAVID·Filed 2012·Granted Apr 22, 2014·39 cites·14 claims
- 0395US7678537B2Graded topcoat materials for immersion lithographyIBM·Filed 2008·Granted Mar 16, 2010·44 cites·19 claims
- 0494US7473749B2Preparation of topcoat compositions and methods of use thereofIBM·Filed 2005·Granted Jan 6, 2009·14 cites·9 claims
- 0593US7399581B2Photoresist topcoat for a photolithographic processIBM·Filed 2005·Granted Jul 15, 2008·14 cites·14 claims
- 0691US8003309B2Photoresist compositions and methods of use in high index immersion lithographyIBM·Filed 2008·Granted Aug 23, 2011·10 cites·1 claims
- 0790US7288362B2Immersion topcoat materials with improved performanceIBM·Filed 2005·Granted Oct 30, 2007·11 cites·25 claims
- 0888US7459183B2Method of forming low-K interlevel dielectric layers and structuresIBM·Filed 2005·Granted Dec 2, 2008·7 cites·1 claims
- 0987US9057960B2Resist performance for the negative tone develop organic development processIBM·Filed 2013·Granted Jun 16, 2015·4 cites·30 claims
- 1087US8821978B2Methods of directed self-assembly and layered structures formed therefromCHENG JOY·Filed 2009·Granted Sep 2, 2014·13 cites·29 claims
- 1185US7763319B2Method of controlling orientation of domains in block copolymer filmsIBM·Filed 2008·Granted Jul 27, 2010·18 cites·1 claims
- 1284US8491965B2Method of controlling orientation of domains in block copolymer filmsCHENG JOY·Filed 2008·Granted Jul 23, 2013·17 cites·15 claims
- 1384US7358035B2Topcoat compositions and methods of use thereofIBM·Filed 2005·Granted Apr 15, 2008·6 cites·17 claims
- 1483US7989026B2Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Aug 2, 2011·4 cites·1 claims
- 1582US10174229B2Adhesive resins for wafer bondingIBM·Filed 2017·Granted Jan 8, 2019·2 cites·16 claims
- 1682US8900802B2Positive tone organic solvent developed chemically amplified resistIBM·Filed 2013·Granted Dec 2, 2014·3 cites·36 claims
- 1782US8802351B2Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithographyBOZANO LUISA DOMINICA·Filed 2012·Granted Aug 12, 2014·4 cites·21 claims
- 1881US9250529B2Photoresist compositions and methods of use in high index immersion lithographyITO HIROSHI·Filed 2012·Granted Feb 2, 2016·2 cites·19 claims
- 1981US7521172B2Topcoat material and use thereof in immersion lithography processesIBM·Filed 2006·Granted Apr 21, 2009·7 cites·17 claims
- 2076US12099043B2Protective enclosure for gas sensorsIBM·Filed 2022·Granted Sep 24, 2024·0 cites·9 claims
- 2176US8530136B2Fluoroalcohol containing molecular photoresist materials and processes of useBOZANO LUISA D·Filed 2010·Granted Sep 10, 2013·4 cites·13 claims
- 2275US8440387B2Graded topcoat materials for immersion lithographyALLEN ROBERT D·Filed 2010·Granted May 14, 2013·6 cites·20 claims
- 2374US10020199B1Porous tin oxide filmsIBM·Filed 2017·Granted Jul 10, 2018·2 cites·20 claims
- 2474US8088873B2Topcoat compositionITO HIROSHI·Filed 2008·Granted Jan 3, 2012·2 cites·20 claims
- 2573US10345700B2Negative-tone resist compositions and multifunctional polymers thereinIBM·Filed 2014·Granted Jul 9, 2019·1 cites·20 claims
- 2673US8236482B2Photoresist compositions and methods of use in high index immersion lithographyITO HIROSHI·Filed 2008·Granted Aug 7, 2012·2 cites·13 claims
- 2770US9850406B2Adhesive resins for wafer bondingIBM·Filed 2015·Granted Dec 26, 2017·1 cites·5 claims
- 2869US8053537B2Method for using a topcoat compositionIBM·Filed 2008·Granted Nov 8, 2011·1 cites·14 claims
- 2968US7951524B2Self-topcoating photoresist for photolithographyIBM·Filed 2008·Granted May 31, 2011·3 cites·26 claims
- 3067US11500285B2Multifunctional polymersIBM·Filed 2018·Granted Nov 15, 2022·0 cites·9 claims
- 3165US8945808B2Self-topcoating resist for photolithographyDAVID ROBERT ALLEN·Filed 2006·Granted Feb 3, 2015·3 cites·16 claims
- 3265US7728089B2Topcoat compositions and methods of use thereofIBM·Filed 2008·Granted Jun 1, 2010·1 cites·13 claims
- 3365US2025309244A1Conversion-type positive electrode with an inorganic top layerIBM·Filed 2024·Application pending·0 cites
- 3464US9181426B2Method of controlling orientation of domains in block copolymer filmsIBM·Filed 2013·Granted Nov 10, 2015·0 cites·15 claims
- 3563US11624740B2Protective enclosure for gas sensorsIBM·Filed 2020·Granted Apr 11, 2023·0 cites·21 claims
- 3663US7820242B2Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structuresIBM·Filed 2008·Granted Oct 26, 2010·0 cites·11 claims
- 3763US2025096237A1Multi-layer cathode for rechargeable batteries and method for making sameIBM·Filed 2023·Application pending·0 cites
- 3861US12110592B2Generating metal-oxide filmIBM·Filed 2020·Granted Oct 8, 2024·0 cites·20 claims
- 3958US8802357B2Method for using a topcoat compositionITO HIROSHI·Filed 2011·Granted Aug 12, 2014·0 cites·7 claims
- 4058US7931829B2Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structuresIBM·Filed 2010·Granted Apr 26, 2011·0 cites·20 claims
- 4158US7910290B2Photoresist topcoat for a photolithographic processIBM·Filed 2008·Granted Mar 22, 2011·0 cites·23 claims
- 4256US7993812B2Calixarene blended molecular glass photoresists and processes of useIBM·Filed 2009·Granted Aug 9, 2011·4 cites·20 claims
- 4354US2008311530A1Graded topcoat materials for immersion lithographyALLEN ROBERT D·Filed 2007·Application pending·0 cites
- 4453US10236184B2Porous tin oxide filmsIBM·Filed 2018·Granted Mar 19, 2019·0 cites·20 claims
- 4553US8034532B2High contact angle topcoat material and use thereof in lithography processIBM·Filed 2006·Granted Oct 11, 2011·4 cites·17 claims
- 4652US7901868B2Photoresist topcoat for a photolithographic processIBM·Filed 2008·Granted Mar 8, 2011·0 cites·21 claims
- 4751US2022390401A1Chemical sensor utilizing electrochemical impedance spectroscopyIBM·Filed 2021·Application pending·0 cites
- 4849US7855045B2Immersion topcoat materials with improved performanceIBM·Filed 2007·Granted Dec 21, 2010·2 cites·13 claims
- 4948US9389516B2Resist performance for the negative tone develop organic development processIBM·Filed 2015·Granted Jul 12, 2016·0 cites·38 claims
- 5047US2007117040A1Water castable-water strippable top coats for 193 nm immersion lithographyIBM·Filed 2005·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →