Inventor · disambiguated record
Sergey Voronin
Also filed as: VORONIN SERGEY · VORONIN SERGEY A · VORONIN SERGEY ALEXANDROVICH
38 granted patents·15 pending applications·74 citations·filing 2012–2025
95Inventor score
Files withTOKYO ELECTRON LTD47VORONIN SERGEY ALEXANDROVICH3EDWARDS LTD2CLEMENTS CHRISTOPHER JAMES PHILIP1
Top patents by PatentIndex Score
53 records- 0197US10063062B2Method of detecting plasma discharge in a plasma processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Aug 28, 2018·40 cites·10 claims
- 0295US11189462B1Ion stratification using bias pulses of short durationTOKYO ELECTRON LTD·Filed 2020·Granted Nov 30, 2021·3 cites·15 claims
- 0391US10237916B2Systems and methods for ESC temperature controlTOKYO ELECTRON LTD·Filed 2015·Granted Mar 19, 2019·7 cites·20 claims
- 0485US12002683B2Lateral etching of siliconTOKYO ELECTRON LTD·Filed 2022·Granted Jun 4, 2024·1 cites·20 claims
- 0582US10903077B2Methods to protect nitride layers during formation of silicon germanium nano-wires in microelectronic workpiecesTOKYO ELECTRON LTD·Filed 2019·Granted Jan 26, 2021·3 cites·24 claims
- 0676US9779952B2Method for laterally trimming a hardmaskTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·3 cites·20 claims
- 0775US2025283760A1Optical emission spectroscopy for advanced process characterizationTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0874US12306044B2Optical emission spectroscopy for advanced process characterizationTOKYO ELECTRON LTD·Filed 2022·Granted May 20, 2025·0 cites·20 claims
- 0972US9512518B2Apparatus for treating a gas streamVORONIN SERGEY ALEXANDROVICH·Filed 2012·Granted Dec 6, 2016·1 cites·11 claims
- 1070US9155183B2Adjustable slot antenna for control of uniformity in a surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2013·Granted Oct 6, 2015·3 cites·20 claims
- 1169US10814336B2Apparatus for treating gasEDWARDS LTD·Filed 2016·Granted Oct 27, 2020·2 cites·12 claims
- 1269US10818502B2System and method of plasma discharge ignition to reduce surface particlesTOKYO ELECTRON LTD·Filed 2017·Granted Oct 27, 2020·1 cites·10 claims
- 1365US10651017B2Method for operation instability detection in a surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2017·Granted May 12, 2020·1 cites·16 claims
- 1465US9277636B2Plasma torchVORONIN SERGEY ALEXANDROVICH·Filed 2012·Granted Mar 1, 2016·3 cites·19 claims
- 1564US2022051875A1Ion Stratification Using Bias Pulses of Short DurationTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1663US12158374B2Time-resolved OES data collectionTOKYO ELECTRON LTD·Filed 2022·Granted Dec 3, 2024·0 cites·20 claims
- 1763US10064262B2Apparatus for treating a gas streamVORONIN SERGEY ALEXANDROVICH·Filed 2012·Granted Aug 28, 2018·1 cites·13 claims
- 1863US9101042B2Control of uniformity in a surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2012·Granted Aug 4, 2015·2 cites·20 claims
- 1961US9346005B2Apparatus for treating a gas streamEDWARDS LTD·Filed 2012·Granted May 24, 2016·1 cites·12 claims
- 2060US12506112B2Method for etching of metalTOKYO ELECTRON LTD·Filed 2022·Granted Dec 23, 2025·0 cites·20 claims
- 2160US2025118532A1System and method for plasma processingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2259US12287578B2Cyclic method for reactive development of photoresistsTOKYO ELECTRON LTD·Filed 2022·Granted Apr 29, 2025·0 cites·20 claims
- 2358US2025293012A1System and method for semiconductor processingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2457US2025264430A1Apparatus and method for plasma measurementTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2556US12362158B2Method for OES data collection and endpoint detectionTOKYO ELECTRON LTD·Filed 2022·Granted Jul 15, 2025·0 cites·20 claims
- 2656US9371581B2Apparatus for treating a gas streamCLEMENTS CHRISTOPHER JAMES PHILIP·Filed 2012·Granted Jun 21, 2016·2 cites·13 claims
- 2755US2024120181A1System and Method for Plasma Process Uniformity ControlTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2855US2025283814A1Method for optical emission spectroscopy (oes) detector signal sensitivity improvementTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2954US2024266149A1Methods for Semiconductor Process ChamberTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3054US2024331979A1Apparatus and Methods for Plasma ProcessingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3154US2024387186A1Method for selective etching by local photon surface activationTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3254US2024339309A1Advanced OES CharacterizationTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3353US11699741B2Metal-containing liner processTOKYO ELECTRON LTD·Filed 2021·Granted Jul 11, 2023·0 cites·19 claims
- 3453US11651970B2Systems and methods for selective ion mass segregation in pulsed plasma atomic layer etchingTOKYO ELECTRON LTD·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 3553US10818482B2Methods for stability monitoring and improvements to plasma sources for plasma processingTOKYO ELECTRON LTD·Filed 2019·Granted Oct 27, 2020·0 cites·20 claims
- 3653US10083820B2Dual-frequency surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2017·Granted Sep 25, 2018·0 cites·21 claims
- 3753US2025138429A1Endpoint detection in dry development of photoresistTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3852US10777385B2Method for RF power distribution in a multi-zone electrode arrayTOKYO ELECTRON LTD·Filed 2017·Granted Sep 15, 2020·0 cites·14 claims
- 3952US10529540B2Advanced methods for plasma systems operationTOKYO ELECTRON LTD·Filed 2018·Granted Jan 7, 2020·0 cites·20 claims
- 4051US11637242B2Methods for resistive RAM (ReRAM) performance stabilization via dry etch clean treatmentTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·10 claims
- 4147US11133194B2Method for selective etching at an interface between materialsTOKYO ELECTRON LTD·Filed 2020·Granted Sep 28, 2021·0 cites·20 claims
- 4246US11398386B2Plasma etch processesTOKYO ELECTRON LTD·Filed 2020·Granted Jul 26, 2022·0 cites·20 claims
- 4346US10998170B2Method for ion mass separation and ion energy control in process plasmasTOKYO ELECTRON LTD·Filed 2019·Granted May 4, 2021·0 cites·18 claims
- 4445US12009430B2Method for gate stack formation and etchingTOKYO ELECTRON LTD·Filed 2020·Granted Jun 11, 2024·0 cites·10 claims
- 4545US10811269B2Method to achieve a sidewall etchTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·0 cites·19 claims
- 4643US10811273B2Methods of surface restoration for nitride etchingTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·0 cites·22 claims
- 4742US10204832B2Method of patterning intersecting structuresTOKYO ELECTRON LTD·Filed 2017·Granted Feb 12, 2019·0 cites·19 claims
- 4842US2019318913A1Apparatus and Method for Controlling Ion Energy Distribution in Process PlasmasTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 4941US9530626B2Method and apparatus for ESC charge control for wafer clampingTOKYO ELECTRON LTD·Filed 2015·Granted Dec 27, 2016·0 cites·20 claims
- 5040US10115591B2Selective SiARC removalTOKYO ELECTRON LTD·Filed 2017·Granted Oct 30, 2018·0 cites·19 claims
Showing the top 50 of 53 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →