Inventor · disambiguated record
Masaaki Hanamura
Also filed as: HANAMURA MASAAKI
7 granted patents·5 pending applications·15 citations·filing 2003–2014
77Inventor score
Top patents by PatentIndex Score
12 records- 0172US8486604B2Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating filmHANAMURA MASAAKI·Filed 2010·Granted Jul 16, 2013·4 cites·19 claims
- 0262US7186448B2Composition and method for temporarily fixing solidJSR CORP·Filed 2003·Granted Mar 6, 2007·7 cites·4 claims
- 0351US7374799B2Radiation sensitive composition, microlens, process for forming microlens and use of the microlensJSR CORP·Filed 2004·Granted May 20, 2008·3 cites·12 claims
- 0450US8443870B2Steam heat exchangerHANAMURA MASAAKI·Filed 2006·Granted May 21, 2013·1 cites·1 claims
- 0550US2008213692A1Radiation sensitive composition, microlens, process for forming the microlens and use of the microlensJSR CORP·Filed 2008·Application pending·0 cites
- 0648US2006275939A1Composition and method for temporarily fixing solidsJSR CORP·Filed 2006·Application pending·0 cites
- 0745US9541827B2Photosensitive composition, cured film and production process thereof, and electronic partJSR CORP·Filed 2014·Granted Jan 10, 2017·0 cites·13 claims
- 0839US7320854B2Radiation sensitive refractive index changing composition, pattern forming method and optical materialJSR CORP·Filed 2004·Granted Jan 22, 2008·0 cites·20 claims
- 0936US7378224B2Method for forming pattern, and optical elementJSR CORP·Filed 2004·Granted May 27, 2008·0 cites·3 claims
- 1036US2006008735A1Radiation sensitive resin composition for forming microlensJSR CORP·Filed 2005·Application pending·0 cites
- 1132US2013012618A1Resin composition, polymer, cured film and electronic partJSR CORP·Filed 2012·Application pending·0 cites
- 1231US2012296053A1Photosensitive composition, cured film and electronic partHANAMURA MASAAKI·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →