Inventor · disambiguated record
Harold Persing
Also filed as: PERSING HAROLD · PERSING HAROLD M
8 granted patents·13 pending applications·60 citations·filing 2003–2011
83Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT16SINGH VIKRAM2MAYNARD HELEN1PAPASOULIOTIS GEORGE1PERSING HAROLD M1
Top patents by PatentIndex Score
21 records- 0192US7397048B2Technique for boron implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Jul 8, 2008·23 cites·16 claims
- 0280US7528389B2Profile adjustment in plasma ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted May 5, 2009·8 cites·25 claims
- 0377US7687787B2Profile adjustment in plasma ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Mar 30, 2010·6 cites·17 claims
- 0476US7132672B2Faraday dose and uniformity monitor for plasma based ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Nov 7, 2006·21 cites·37 claims
- 0566US7615748B2Outgassing rate detectionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Nov 10, 2009·2 cites·15 claims
- 0654US7638781B2Local pressure sensing in a plasma processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Dec 29, 2009·0 cites·10 claims
- 0747US2007065576A1Technique for atomic layer depositionSINGH VIKRAM·Filed 2005·Application pending·0 cites
- 0846US2008318345A1Plasma ion implantation process control using reflectometryPERSING HAROLD M·Filed 2007·Application pending·0 cites
- 0946US2007170867A1Plasma Immersion Ion Source With Low Effective Antenna VoltageVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 1045US2009104719A1Plasma Doping System with In-Situ Chamber Condition MonitoringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1145US2008169183A1Plasma Source with Liner for Reducing Metal ContaminationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1245US2005205212A1RF Plasma Source With Conductive Top SectionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
- 1342US2008160170A1Technique for using an improved shield ring in plasma-based ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 1442US2007087581A1Technique for atomic layer depositionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 1542US2005205211A1Plasma immersion ion implantion apparatus and methodSINGH VIKRAM·Filed 2004·Application pending·0 cites
- 1639US2007084564A1Conformal doping apparatus and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Application pending·0 cites
- 1739US2005260354A1In-situ process chamber preparation methods for plasma ion implantation systemsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
- 1839US2005287307A1Etch and deposition control for plasma implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
- 1938US8877654B2Pulsed plasma to affect conformal processingMAYNARD HELEN·Filed 2010·Granted Nov 4, 2014·0 cites·12 claims
- 2036US8728587B2Closed loop process control of plasma processed materialsPAPASOULIOTIS GEORGE·Filed 2011·Granted May 20, 2014·0 cites·7 claims
- 2136US2006043316A1Ion implanter having enhanced low energy ion beam transportVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →