Inventor · disambiguated record
Uwe Mickan
Also filed as: MICKAN UWE
20 granted patents·4 pending applications·72 citations·filing 2003–2018
93Inventor score
Files withASML NETHERLANDS BV20DE BOEIJ WILHELMUS PETRUS1DE VRIES GOSSE CHARLES1LOOPSTRA ERIK ROELOF1MICKAN UWE1
Top patents by PatentIndex Score
24 records- 0182US7960074B2Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Jun 14, 2011·6 cites·8 claims
- 0279US7514186B2System for electrically connecting a mask to earth, a maskASML NETHERLANDS BV·Filed 2005·Granted Apr 7, 2009·7 cites·20 claims
- 0368US7834975B2Method and exposure apparatus for performing a tilted focus and a device manufactured accordinglyASML NETHERLANDS BV·Filed 2006·Granted Nov 16, 2010·2 cites·20 claims
- 0468US7817246B2Optical apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 19, 2010·2 cites·19 claims
- 0567US2019086819A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 0665US9606448B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·2 cites·39 claims
- 0764US7145640B2Lithographic apparatus, device manufacturing method and variable attenuatorASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·8 cites·22 claims
- 0863US8208123B2Lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2004·Granted Jun 26, 2012·6 cites·40 claims
- 0962US7098994B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Aug 29, 2006·7 cites·29 claims
- 1061US7042550B2Device manufacturing method and computer programASML NETHERLANDS BV·Filed 2003·Granted May 9, 2006·8 cites·19 claims
- 1161US6980281B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 27, 2005·6 cites·17 claims
- 1260US8634062B2Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing methodDE VRIES GOSSE CHARLES·Filed 2009·Granted Jan 21, 2014·1 cites·15 claims
- 1359US7518706B2Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordinglyASML NETHERLANDS BV·Filed 2004·Granted Apr 14, 2009·5 cites·9 claims
- 1457US7713665B2Lithographic apparatus and patterning deviceASML NETHERLANDS BV·Filed 2006·Granted May 11, 2010·2 cites·21 claims
- 1555US10146142B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Dec 4, 2018·0 cites·20 claims
- 1654US7463336B2Device manufacturing method and apparatus with applied electric fieldASML NETHERLANDS BV·Filed 2004·Granted Dec 9, 2008·3 cites·19 claims
- 1754US7177010B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·3 cites·30 claims
- 1849US9442388B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Sep 13, 2016·0 cites·20 claims
- 1949US7136149B2Lithographic apparatus with autofocus systemASML NETHERLANDS BV·Filed 2004·Granted Nov 14, 2006·2 cites·20 claims
- 2047US7369216B2Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted May 6, 2008·1 cites·28 claims
- 2147US7092072B2Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Aug 15, 2006·1 cites·41 claims
- 2238US2012262690A1Illumination system, lithographic apparatus and illumination methodDE BOEIJ WILHELMUS PETRUS·Filed 2010·Application pending·0 cites
- 2337US2005134820A1Method for exposing a substrate, patterning device, and lithographic apparatusASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 2435US2011310369A1Lithographic method and apparatusMICKAN UWE·Filed 2011·Application pending·0 cites
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