Inventor · disambiguated record
Doo-Hoon Goo
Also filed as: GOO DOO-HOON
11 granted patents·2 pending applications·58 citations·filing 1999–2010
87Inventor score
Top patents by PatentIndex Score
13 records- 0168US7375390B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 20, 2008·3 cites·5 claims
- 0266US6147033AApparatus and method for forming a film on a tape substrateKOREA ADVANCED INST SCI & TECH·Filed 1999·Granted Nov 14, 2000·29 cites·13 claims
- 0365US7259065B2Method of forming trench in semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 21, 2007·2 cites·17 claims
- 0463US8013374B2Semiconductor memory devices including offset bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·2 cites·16 claims
- 0563US7064051B2Method of forming self-aligned contact pads of non-straight type semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 20, 2006·11 cites·15 claims
- 0655US7547936B2Semiconductor memory devices including offset active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 16, 2009·1 cites·19 claims
- 0751US7176512B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·4 cites·14 claims
- 0850US6757052B2Single aperture optical system for photolithography systemsSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jun 29, 2004·3 cites·9 claims
- 0948US7068371B2Methods and apparatus for aligning a wafer in which multiple light beams are used to scan alignment marksSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 27, 2006·2 cites·21 claims
- 1043US7221014B2DRAM devices having an increased density layoutSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·1 cites·20 claims
- 1142US8287792B2Methods of forming fine patterns using a nanoimprint lithographyLEE JEONG-HOON·Filed 2010·Granted Oct 16, 2012·0 cites·11 claims
- 1238US2004189971A1Wafer edge exposing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1333US2010230864A1Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the SamePARK CHANG-MIN·Filed 2010·Application pending·0 cites
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