Inventor · disambiguated record
Chester T. Dziobkowski
Also filed as: DZIOBKOWSKI CHESTER · DZIOBKOWSKI CHESTER T
15 granted patents·196 citations·filing 1998–2008
93Inventor score
Files withIBM15
Top patents by PatentIndex Score
15 records- 0195US7402532B2Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layerIBM·Filed 2006·Granted Jul 22, 2008·28 cites·1 claims
- 0292US7067368B1Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2005·Granted Jun 27, 2006·17 cites·10 claims
- 0387US6500772B2Methods and materials for depositing films on semiconductor substratesIBM·Filed 2001·Granted Dec 31, 2002·40 cites·8 claims
- 0482US7102232B2Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layerIBM·Filed 2004·Granted Sep 5, 2006·19 cites·13 claims
- 0579US7271455B2Formation of fully silicided metal gate using dual self-aligned silicide processIBM·Filed 2004·Granted Sep 18, 2007·20 cites·9 claims
- 0678US7122472B2Method for forming self-aligned dual fully silicided gates in CMOS devicesIBM·Filed 2004·Granted Oct 17, 2006·23 cites·36 claims
- 0777US7820559B2Structure to improve adhesion between top CVD low-K dielectric and dielectric capping layerIBM·Filed 2008·Granted Oct 26, 2010·4 cites·19 claims
- 0877US7112481B2Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2005·Granted Sep 26, 2006·5 cites·20 claims
- 0970US6916729B2Salicide formation methodIBM·Filed 2003·Granted Jul 12, 2005·16 cites·11 claims
- 1069US7785999B2Formation of fully silicided metal gate using dual self-aligned silicide processIBM·Filed 2007·Granted Aug 31, 2010·3 cites·11 claims
- 1162US7910484B2Method for preventing backside defects in dielectric layers formed on semiconductor substratesIBM·Filed 2008·Granted Mar 22, 2011·1 cites·12 claims
- 1258US6726996B2Laminated diffusion barrierIBM·Filed 2001·Granted Apr 27, 2004·8 cites·19 claims
- 1354US7064025B1Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2004·Granted Jun 20, 2006·4 cites·21 claims
- 1448US6046457ACharged particle beam apparatus having anticontamination meansIBM·Filed 1998·Granted Apr 4, 2000·8 cites·10 claims
- 1537US7223691B2Method of forming low resistance and reliable via in inter-level dielectric interconnectIBM·Filed 2004·Granted May 29, 2007·0 cites·10 claims
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