Inventor · disambiguated record
Issei Ueda
Also filed as: UEDA ISSEI
50 granted patents·1 pending application·3,236 citations·filing 1979–2014
99Inventor score
Top patents by PatentIndex Score
51 records- 0198US6656281B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Dec 2, 2003·518 cites·19 claims
- 0298US6439822B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 1999·Granted Aug 27, 2002·540 cites·15 claims
- 0398US6074154ASubstrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 1997·Granted Jun 13, 2000·457 cites·8 claims
- 0498US5826129ASubstrate processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Oct 20, 1998·552 cites·23 claims
- 0595US7241061B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jul 10, 2007·34 cites·21 claims
- 0694US7281869B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 16, 2007·30 cites·34 claims
- 0794US7267497B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 11, 2007·29 cites·13 claims
- 0894US6471422B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Oct 29, 2002·63 cites·13 claims
- 0993US6672779B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Jan 6, 2004·51 cites·22 claims
- 1092US6425722B1Substrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·54 cites·6 claims
- 1192US6402401B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·49 cites·66 claims
- 1291US7245348B2Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Jul 17, 2007·18 cites·27 claims
- 1391US6402400B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·60 cites·19 claims
- 1491US5711646ASubstrate transfer apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jan 27, 1998·128 cites·20 claims
- 1588US6379056B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 30, 2002·40 cites·14 claims
- 1688US6340643B2Treatment solution supply methodTOKYO ELECTRON LTD·Filed 2001·Granted Jan 22, 2002·35 cites·4 claims
- 1785US6426303B1Processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·30 cites·13 claims
- 1885US6293713B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 25, 2001·34 cites·20 claims
- 1985US6290405B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 18, 2001·34 cites·13 claims
- 2083US6726771B2Treatment solution supply method and treatment solution supply unitTOKYO ELECTRON LTD·Filed 2001·Granted Apr 27, 2004·24 cites·8 claims
- 2183US6338582B1Substrate delivery apparatus and coating and developing processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jan 15, 2002·28 cites·13 claims
- 2281US6399518B1Resist coating and developing processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 4, 2002·26 cites·19 claims
- 2381US6341903B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jan 29, 2002·25 cites·8 claims
- 2480US6309116B1Substrate processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Oct 30, 2001·26 cites·16 claims
- 2579US6444029B1Multistage spin type substrate processing systemTOKYO ELECTRON LTD·Filed 1999·Granted Sep 3, 2002·57 cites·8 claims
- 2678US7793609B2Coating and developing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Sep 14, 2010·5 cites·6 claims
- 2777US8408158B2Coating/developing device and methodAKIMOTO MASAMI·Filed 2006·Granted Apr 2, 2013·7 cites·19 claims
- 2877US8206076B2Substrate processing systemUEDA ISSEI·Filed 2008·Granted Jun 26, 2012·8 cites·15 claims
- 2977US6919913B1Processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jul 19, 2005·21 cites·7 claims
- 3077US6402508B2Heat and cooling treatment apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·19 cites·10 claims
- 3177US6332724B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Dec 25, 2001·24 cites·19 claims
- 3276US9373531B2Substrate transfer device, substrate processing apparatus, and substrate accommodation methodTOKYO ELECTRON LTD·Filed 2014·Granted Jun 21, 2016·3 cites·13 claims
- 3374US6655891B2Substrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 2002·Granted Dec 2, 2003·13 cites·9 claims
- 3474US6264381B1Process systemTOKYO ELECTRON LTD·Filed 2000·Granted Jul 24, 2001·17 cites·21 claims
- 3574US6161969AApparatus for processing a substrateTOKYO ELECTRON LTD·Filed 1999·Granted Dec 19, 2000·44 cites·20 claims
- 3673US8978670B2Substrate processing apparatusMINAMIDA JUNYA·Filed 2010·Granted Mar 17, 2015·4 cites·6 claims
- 3773US6746197B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Jun 8, 2004·14 cites·6 claims
- 3868US6319322B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Nov 20, 2001·34 cites·20 claims
- 3967US6299363B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Oct 9, 2001·11 cites·14 claims
- 4064US9666463B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 30, 2017·1 cites·6 claims
- 4162US6318948B1Substrate transfer apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Nov 20, 2001·26 cites·18 claims
- 4261US6432204B1Temperature and humidity controlled processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·7 cites·14 claims
- 4359US8845262B2Substrate processing apparatus, substrate processing method and storage medium storing substrate processing programMURATA AKIRA·Filed 2011·Granted Sep 30, 2014·1 cites·16 claims
- 4450US6126703ASubstrate processing apparatus having an interface section including two stacked substrate waiting tableTOKYO ELECTRON LTD·Filed 1997·Granted Oct 3, 2000·13 cites·6 claims
- 4544US8302556B2Coating and developing apparatusAKIMOTO MASAMI·Filed 2010·Granted Nov 6, 2012·0 cites·16 claims
- 4643US6405094B1Apparatus and method of collecting substrates abnormally processed or processed previous to ordinary processingTOKYO ELECTRON LTD·Filed 1999·Granted Jun 11, 2002·9 cites·16 claims
- 4740US6264705B1Processing systemTOKYO ELECTRON LTD·Filed 1999·Granted Jul 24, 2001·6 cites·20 claims
- 4837US2002088544A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Application pending·0 cites
- 4936US8662811B2Substrate processing apparatusMINAMIDA JUNYA·Filed 2010·Granted Mar 4, 2014·0 cites·6 claims
- 5036US4338241ASynthetic resin compositionONOMICHI KUMIKA K K·Filed 1979·Granted Jul 6, 1982·5 cites·15 claims
Showing the top 50 of 51 patent records by PatentIndex Score.
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