Inventor · disambiguated record
Daniel Jason Riggs
Also filed as: RIGGS DANIEL J · RIGGS DANIEL JASON
19 granted patents·3 pending applications·102 citations·filing 2009–2024
93Inventor score
Top patents by PatentIndex Score
22 records- 0196US9426872B1System and method for controlling source laser firing in an LPP EUV light sourceASML NETHERLANDS BV·Filed 2015·Granted Aug 23, 2016·9 cites·20 claims
- 0294US9820368B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Nov 14, 2017·5 cites·46 claims
- 0394US9713240B2Stabilizing EUV light power in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Jul 18, 2017·7 cites·20 claims
- 0491US8598552B1System and method to optimize extreme ultraviolet light generationFRIHAUF PAUL·Filed 2012·Granted Dec 3, 2013·25 cites·20 claims
- 0590US11096266B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2020·Granted Aug 17, 2021·2 cites·20 claims
- 0690US8411720B2System and method for automatic gas optimization in a two-chamber gas discharge laser systemO'BRIEN KEVIN MICHAEL·Filed 2011·Granted Apr 2, 2013·18 cites·21 claims
- 0789US9980359B2Systems and methods for controlling EUV energy generation using pulse intensityASML NETHERLANDS BV·Filed 2015·Granted May 22, 2018·4 cites·14 claims
- 0886US10314153B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2017·Granted Jun 4, 2019·2 cites·32 claims
- 0984US9536631B1Systems and methods to avoid instability conditions in a source plasma chamberASML NETHERLANDS BV·Filed 2015·Granted Jan 3, 2017·3 cites·16 claims
- 1083US9755396B1EUV LPP source with improved dose control by combining pulse modulation and pulse control modeASML NETHERLANDS BV·Filed 2016·Granted Sep 5, 2017·4 cites·19 claims
- 1183US8254420B2Advanced laser wavelength controlRIGGS DANIEL J·Filed 2009·Granted Aug 28, 2012·13 cites·13 claims
- 1281US10674591B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2019·Granted Jun 2, 2020·1 cites·27 claims
- 1378US9000403B2System and method for adjusting seed laser pulse width to control EUV output energyCYMER INC·Filed 2013·Granted Apr 7, 2015·3 cites·18 claims
- 1477US12174550B2Calibration system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2020·Granted Dec 24, 2024·1 cites·23 claims
- 1571US8873600B2System and method for high accuracy gas refill in a two chamber gas discharge laser systemJIANG RUI·Filed 2011·Granted Oct 28, 2014·3 cites·25 claims
- 1669US2025085641A1Calibration system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1767US8767791B2System and method for controlling gas concentration in a two-chamber gas discharge laser systemRIGGS DANIEL J·Filed 2011·Granted Jul 1, 2014·2 cites·21 claims
- 1856US2024361222A1Droplet detection metrology utilizing metrology beam scatteringASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1951US2023269858A1Systems and methods for laser-to-droplet alignmentASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2042US9240664B2System and method for extending gas life in a two chamber gas discharge laser systemRIGGS DANIEL J·Filed 2011·Granted Jan 19, 2016·0 cites·23 claims
- 2141US9832854B2Systems and methods for stabilization of droplet-plasma interaction via laser energy modulationASML NETHERLANDS BV·Filed 2015·Granted Nov 28, 2017·0 cites·9 claims
- 2237US8681832B2System and method for high accuracy gas inject in a two chamber gas discharge laser systemRIGGS DANIEL J·Filed 2011·Granted Mar 25, 2014·0 cites·23 claims
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