Inventor · disambiguated record
Steven R. Walther
Also filed as: WALTHER STEVEN · WALTHER STEVEN R · WALTHER STEVEN RAYMOND
37 granted patents·22 pending applications·459 citations·filing 1991–2023
97Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT30WALTHER STEVEN R4BUFANO MICHAEL LAWRENCE3MKS INSTR INC3ADVANCED ION BEAM TECH INC2
Top patents by PatentIndex Score
59 records- 0196US6323497B1Method and apparatus for controlling ion implantation during vacuum fluctuationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2000·Granted Nov 27, 2001·73 cites·15 claims
- 0295US7820460B2Patterned assembly for manufacturing a solar cell and a method thereofVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 26, 2010·37 cites·28 claims
- 0393US7544957B2Non-uniform ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Jun 9, 2009·19 cites·12 claims
- 0492US9736920B2Apparatus and method for plasma ignition with a self-resonating deviceMKS INSTR INC·Filed 2015·Granted Aug 15, 2017·12 cites·27 claims
- 0591US7935942B2Technique for low-temperature ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted May 3, 2011·16 cites·19 claims
- 0690US8470616B2Patterned assembly for manufacturing a solar cell and a method thereofSULLIVAN PAUL·Filed 2012·Granted Jun 25, 2013·7 cites·20 claims
- 0788US12358768B2Load-compensating device for a lifting application with an object to be lifted or loweredSIEMENS AG·Filed 2023·Granted Jul 15, 2025·1 cites·6 claims
- 0887US8222053B2Patterned assembly for manufacturing a solar cell and a method thereofSULLIVAN PAUL·Filed 2009·Granted Jul 17, 2012·9 cites·20 claims
- 0987US7342240B2Ion beam current monitoringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Mar 11, 2008·9 cites·21 claims
- 1087US7326937B2Plasma ion implantation systems and methods using solid source of dopant materialVERIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Feb 5, 2008·17 cites·26 claims
- 1187US6716727B2Methods and apparatus for plasma doping and ion implantation in an integrated processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Apr 6, 2004·39 cites·33 claims
- 1285US7675730B2Techniques for detecting wafer charging in a plasma processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Mar 9, 2010·8 cites·44 claims
- 1384US5198677AProduction of N+ ions from a multicusp ion beam apparatusUS ENERGY·Filed 1991·Granted Mar 30, 1993·53 cites·6 claims
- 1483US8319196B2Technique for low-temperature ion implantationENGLAND JONATHAN G·Filed 2011·Granted Nov 27, 2012·7 cites·20 claims
- 1583US8293173B2Electron beam sterilization apparatusBUFANO MICHAEL LAWRENCE·Filed 2010·Granted Oct 23, 2012·9 cites·20 claims
- 1682US7396746B2Methods for stable and repeatable ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Jul 8, 2008·39 cites·7 claims
- 1780US6521895B1Wide dynamic range ion beam scannersVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Feb 18, 2003·33 cites·40 claims
- 1879US6686598B1Wafer clamping apparatus and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2000·Granted Feb 3, 2004·21 cites·50 claims
- 1978US8636949B2Electron beam sterilization apparatusBUFANO MICHAEL LAWRENCE·Filed 2012·Granted Jan 28, 2014·5 cites·20 claims
- 2078US7993698B2Techniques for temperature controlled ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Aug 9, 2011·5 cites·8 claims
- 2176US10076020B2Apparatus and method for plasma ignition with a self-resonating deviceMKS INSTR INC·Filed 2017·Granted Sep 11, 2018·2 cites·29 claims
- 2276US7132672B2Faraday dose and uniformity monitor for plasma based ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Nov 7, 2006·21 cites·37 claims
- 2375US8339024B2Methods and apparatuses for reducing heat on an emitter exit windowWALTHER STEVEN R·Filed 2010·Granted Dec 25, 2012·3 cites·38 claims
- 2472USRE40008EMethod and apparatus for controlling ion implantation during vacuum fluctuationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2003·Granted Jan 22, 2008·7 cites·43 claims
- 2566US7615748B2Outgassing rate detectionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Nov 10, 2009·2 cites·15 claims
- 2662US7820527B2Cleave initiation using varying ion implant doseVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 26, 2010·2 cites·19 claims
- 2762US7459703B2Ion implant beam angle integrity monitoring and adjustingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Dec 2, 2008·1 cites·24 claims
- 2861US7939424B2Wafer bonding activated by ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted May 10, 2011·1 cites·14 claims
- 2956US12290697B2Process control for atmospheric plasma treatment of surfacesWALTHER STEVEN R·Filed 2021·Granted May 6, 2025·0 cites·23 claims
- 3056US7378335B2Plasma implantation of deuterium for passivation of semiconductor-device interfacesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted May 27, 2008·1 cites·19 claims
- 3154US8766523B2Electron beam exit window in electron beam emitter and method for forming the sameWALTHER STEVEN R·Filed 2012·Granted Jul 1, 2014·0 cites·18 claims
- 3254US7820987B2Predicting dose repeatability in an ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Oct 26, 2010·0 cites·25 claims
- 3354US7638781B2Local pressure sensing in a plasma processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Dec 29, 2009·0 cites·10 claims
- 3454US7544959B2In situ surface contamination removal for ion implantingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Jun 9, 2009·0 cites·10 claims
- 3550US11942343B2Wafer temperature measurement in an ion implantation systemADVANCED ION BEAM TECH INC·Filed 2021·Granted Mar 26, 2024·0 cites·28 claims
- 3650US2009008577A1Conformal Doping Using High Neutral Density Plasma ImplantVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 3749US8338796B2Electron beam emitter with slotted gunWALTHER STEVEN RAYMOND·Filed 2009·Granted Dec 25, 2012·0 cites·28 claims
- 3848US2009104761A1Plasma Doping System With Charge ControlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 3946US2010155026A1Condensible gas cooling systemWALTHER STEVEN R·Filed 2008·Application pending·0 cites
- 4045US10843911B2Lifting apparatusSIEMENS AG·Filed 2016·Granted Nov 24, 2020·0 cites·3 claims
- 4145US2009084757A1Uniformity control for ion beam assisted etchingEROKHIN YURI·Filed 2007·Application pending·0 cites
- 4244US2007069157A1Methods and apparatus for plasma implantation with improved dopant profileVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Application pending·0 cites
- 4344US2008132046A1Plasma Doping With Electronically Controllable Implant AngleVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 4441US2004016402A1Methods and apparatus for monitoring plasma parameters in plasma doping systemsFiled 2002·Application pending·0 cites
- 4541US2008160212A1Method and apparatuses for providing electrical contact for plasma processing applicationsKOO BON-WOONG·Filed 2006·Application pending·0 cites
- 4641US2006121704A1Plasma ion implantation system with axial electrostatic confinementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
- 4740US2014209820A1Contoured support grid for hermetically sealed thin film applicationsBARRY KENNETH J·Filed 2014·Application pending·0 cites
- 4840US2006099830A1Plasma implantation using halogenated dopant species to limit deposition of surface layersVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
- 4940US2018315605A1Method for Ion ImplantationADVANCED ION BEAM TECH INC·Filed 2018·Application pending·0 cites
- 5039US2005260354A1In-situ process chamber preparation methods for plasma ion implantation systemsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
Showing the top 50 of 59 patent records by PatentIndex Score.
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