Inventor · disambiguated record
Karl-Heinz Schuster
Also filed as: SCHUSTER KARL · SCHUSTER KARL H · SCHUSTER KARL-HEINZ
110 granted patents·27 pending applications·4,068 citations·filing 1978–2017
99Inventor score
Files withZEISS CARL SMT AG66ZEISS STIFTUNG27ZEISS CARL SMT GMBH11SCHUSTER KARL-HEINZ6ZEISS CARL SEMICONDUCTOR MFG6
Top patents by PatentIndex Score
137 records- 0199US7442908B2Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrateZEISS CARL SMT AG·Filed 2005·Granted Oct 28, 2008·87 cites·18 claims
- 0298US7495840B2Very high-aperture projection objectiveSCHUSTER KARL-HEINZ·Filed 2007·Granted Feb 24, 2009·113 cites·16 claims
- 0398US7382540B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Jun 3, 2008·105 cites·3 claims
- 0498US7339743B2Very-high aperture projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Mar 4, 2008·114 cites·35 claims
- 0598US7203008B2Very high-aperture projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Apr 10, 2007·107 cites·51 claims
- 0698US7190527B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Mar 13, 2007·161 cites·57 claims
- 0798US6878916B2Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection systemZEISS CARL SMT AG·Filed 2002·Granted Apr 12, 2005·153 cites·45 claims
- 0898US6438199B1Illumination system particularly for microlithographyZEISS STIFTUNG·Filed 2000·Granted Aug 20, 2002·199 cites·65 claims
- 0998US6198793B1Illumination system particularly for EUV lithographyZEISS STIFTUNG·Filed 1999·Granted Mar 6, 2001·236 cites·54 claims
- 1098US6191880B1Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangementZEISS STIFTUNG·Filed 1999·Granted Feb 20, 2001·288 cites·5 claims
- 1197US6891683B2Refractive projection objective with a waistZEISS CARL SMT AG·Filed 2003·Granted May 10, 2005·128 cites·32 claims
- 1297US6392800B2Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangementZEISS STIFTUNG·Filed 2000·Granted May 21, 2002·123 cites·2 claims
- 1397US6252712B1Optical system with polarization compensatorZEISS STIFTUNG·Filed 1999·Granted Jun 26, 2001·213 cites·14 claims
- 1496US7154676B2Very-high aperture projection objectiveCARL ZEISS SMT A G·Filed 2004·Granted Dec 26, 2006·78 cites·81 claims
- 1596US7092069B2Projection exposure method and projection exposure systemZEISS CARL SMT AG·Filed 2004·Granted Aug 15, 2006·95 cites·40 claims
- 1696US6483573B1Projection exposure system and an exposure method in microlithographyZEISS STIFTUNG·Filed 2000·Granted Nov 19, 2002·84 cites·12 claims
- 1795US6856379B2Polarizer and microlithography projection system with a polarizerZEISS CARL SMT AG·Filed 2002·Granted Feb 15, 2005·81 cites·63 claims
- 1895US6417974B1Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production methodFiled 2000·Granted Jul 9, 2002·76 cites·18 claims
- 1994US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 2094US6885502B2Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangementZEISS STIFTUNG·Filed 2002·Granted Apr 26, 2005·47 cites·2 claims
- 2194US6631036B2Catadioptric objectiveZEISS STIFTUNG·Filed 2000·Granted Oct 7, 2003·67 cites·51 claims
- 2294US6600608B1Catadioptric objective comprising two intermediate imagesZEISS STIFTUNG·Filed 1999·Granted Jul 29, 2003·129 cites·64 claims
- 2393US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 2493US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 2593US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 2693US6646718B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·49 cites·11 claims
- 2793US6169627B1Catadioptric microlithographic reduction objectiveZEISS STIFTUNG·Filed 1999·Granted Jan 2, 2001·99 cites·34 claims
- 2892US7113260B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2005·Granted Sep 26, 2006·13 cites·3 claims
- 2992US6504597B2Optical arrangementZEISS STIFTUNG·Filed 2001·Granted Jan 7, 2003·54 cites·15 claims
- 3091US10337850B2Interferometric measuring arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Jul 2, 2019·10 cites·13 claims
- 3191US7466489B2Projection objective having a high aperture and a planar end surfaceBEDER SUSANNE·Filed 2005·Granted Dec 16, 2008·17 cites·98 claims
- 3290US7428105B2Objectives as a microlithography projection objective with at least one liquid lensZEISS CARL SMT AG·Filed 2007·Granted Sep 23, 2008·9 cites·26 claims
- 3390US6930758B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2001·Granted Aug 16, 2005·36 cites·45 claims
- 3490US6349005B1Microlithographic reduction objective, projection exposure equipment and processZEISS STIFTUNG·Filed 1999·Granted Feb 19, 2002·74 cites·29 claims
- 3589US7751127B2Projection objective and method for optimizing a system aperture stop of a projection objectiveZEISS CARL SMT AG·Filed 2008·Granted Jul 6, 2010·8 cites·18 claims
- 3689US7411656B2Optically polarizing retardation arrangement, and a microlithography projection exposure machineZEISS CARL SMT AG·Filed 2006·Granted Aug 12, 2008·20 cites·36 claims
- 3789US6781668B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Aug 24, 2004·36 cites·14 claims
- 3889US6496306B1Catadioptric optical system and exposure apparatus having the sameZEISS STIFTUNG·Filed 1999·Granted Dec 17, 2002·64 cites·20 claims
- 3989US6084708ADouble-refracting planar plate arrangement and deep ultraviolet λ/4-plateZEISS STIFTUNG·Filed 1997·Granted Jul 4, 2000·69 cites·33 claims
- 4086US7532306B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted May 12, 2009·17 cites·10 claims
- 4186US7203007B2Projection exposure machine comprising a projection lensZEISS CARL SMT AG·Filed 2004·Granted Apr 10, 2007·23 cites·75 claims
- 4285US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 4385US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
- 4485US6788387B2Lithographic objective having a first lens group including only lenses having a positive refractive powerZEISS CARL SEMICONDUCTOR MFG·Filed 2001·Granted Sep 7, 2004·23 cites·14 claims
- 4585US6597498B1Optical system for the vacuum ultravioletZEISS STIFTUNG·Filed 2000·Granted Jul 22, 2003·24 cites·8 claims
- 4684US7186983B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·21 cites·21 claims
- 4784US6801364B2Projection objective for microlithographyZEISS CARL SMT AG·Filed 2001·Granted Oct 5, 2004·24 cites·40 claims
- 4882US7375897B2Imaging systemsZEISS CARL SMT AG·Filed 2005·Granted May 20, 2008·6 cites·61 claims
- 4981US7053988B2Optically polarizing retardation arrangement, and microlithography projection exposure machineZEISS CARL SMT AG·Filed 2003·Granted May 30, 2006·20 cites·48 claims
- 5081US4217213ADevice for the separation of minute magnetizable particles, method and apparatusSIEMENS AG·Filed 1978·Granted Aug 12, 1980·34 cites·22 claims
Showing the top 50 of 137 patent records by PatentIndex Score.
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