Inventor · disambiguated record
Antonius Johannes Josephus Van Dijsseldonk
Also filed as: VAN DIJSSELDONK ANTONIUS J J · VAN DIJSSELDONK ANTONIUS JOHAN · VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS · VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS VAN DIJSSELDONK
33 granted patents·1 pending application·422 citations·filing 2000–2017
97Inventor score
Files withASML NETHERLANDS BV27BANINE VADIM YEVGENYEVICH2VAN SCHOOT JAN BERNARD PLECHELMUS2AMSL NETHERLANDS BV1GROENEVELD ROGIER HERMAN MATHIJS1
Top patents by PatentIndex Score
34 records- 0197US6927004B2Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 9, 2005·100 cites·17 claims
- 0296US6737662B2Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program productASML NETHERLANDS BV·Filed 2002·Granted May 18, 2004·109 cites·23 claims
- 0388US6765712B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jul 20, 2004·30 cites·26 claims
- 0483US7148952B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 12, 2006·24 cites·20 claims
- 0583US6593585B1Lithographic projection apparatus with positioning system for use with reflectorsASML NETHERLANDS BV·Filed 2000·Granted Jul 15, 2003·26 cites·29 claims
- 0680US6940587B2Lithographic apparatus and a measurement systemASML NETHERLANDS BV·Filed 2003·Granted Sep 6, 2005·17 cites·29 claims
- 0777US6597434B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jul 22, 2003·20 cites·40 claims
- 0876US7312860B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 25, 2007·4 cites·2 claims
- 0975US6750949B2Lithographic apparatus and device manufacturing methodAMSL NETHERLANDS BV·Filed 2002·Granted Jun 15, 2004·19 cites·28 claims
- 1074US9835950B2Radiation sourceASML NETHERLANDS BV·Filed 2014·Granted Dec 5, 2017·4 cites·24 claims
- 1171US9341960B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted May 17, 2016·2 cites·20 claims
- 1268US7817246B2Optical apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 19, 2010·2 cites·19 claims
- 1368US7253880B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Aug 7, 2007·9 cites·34 claims
- 1466US7116399B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Oct 3, 2006·8 cites·16 claims
- 1565US8908144B2Lithographic apparatus and device manufacturing methodGROENEVELD ROGIER HERMAN MATHIJS·Filed 2006·Granted Dec 9, 2014·3 cites·11 claims
- 1664US7145640B2Lithographic apparatus, device manufacturing method and variable attenuatorASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·8 cites·22 claims
- 1761US9523921B2EUV radiation system and lithographic apparatusVAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS·Filed 2010·Granted Dec 20, 2016·1 cites·15 claims
- 1861US7151594B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Dec 19, 2006·6 cites·14 claims
- 1960US7307262B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·6 cites·20 claims
- 2058US7023524B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 4, 2006·5 cites·13 claims
- 2158US6987275B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 17, 2006·6 cites·24 claims
- 2258US6967756B2Lithographic apparatus device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Nov 22, 2005·4 cites·34 claims
- 2355US10001709B2Lithographic apparatus, spectral purity filter and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jun 19, 2018·0 cites·18 claims
- 2454US7463336B2Device manufacturing method and apparatus with applied electric fieldASML NETHERLANDS BV·Filed 2004·Granted Dec 9, 2008·3 cites·19 claims
- 2553US9097982B2Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filterBANINE VADIM YEVGENYEVICH·Filed 2009·Granted Aug 4, 2015·0 cites·20 claims
- 2652US6597431B2Lithographic projection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2001·Granted Jul 22, 2003·4 cites·16 claims
- 2749US7136149B2Lithographic apparatus with autofocus systemASML NETHERLANDS BV·Filed 2004·Granted Nov 14, 2006·2 cites·20 claims
- 2848US9958787B2Lithographic method and apparatusASML NETHERLANDS BV·Filed 2013·Granted May 1, 2018·0 cites·19 claims
- 2948US8570489B2Lithographic projection apparatus and method of compensating perturbation factorsVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2008·Granted Oct 29, 2013·0 cites·24 claims
- 3047US9594306B2Lithographic apparatus, spectral purity filter and device manufacturing methodBANINE VADIM YEVGENYEVICH·Filed 2011·Granted Mar 14, 2017·0 cites·17 claims
- 3145US8830444B2Lithographic apparatus and methodVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2011·Granted Sep 9, 2014·0 cites·15 claims
- 3243US6765218B2Lithographic projection apparatus with positioning system for use with reflectorsASML NETHERLANDS BV·Filed 2003·Granted Jul 20, 2004·0 cites·56 claims
- 3338US7423721B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 9, 2008·0 cites·29 claims
- 3437US2005134820A1Method for exposing a substrate, patterning device, and lithographic apparatusASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →