Inventor · disambiguated record
Tsuguo Yamaoka
Also filed as: YAMAOKA TSUGUO
35 granted patents·822 citations·filing 1976–2016
98Inventor score
Files withFUJI PHOTO FILM CO LTD6SHINETSU CHEMICAL CO6KANSAI PAINT CO LTD4KYOWA HAKKO KOGYO KK4DAIKIN IND LTD3
Top patents by PatentIndex Score
35 records- 0196US5942367AChemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking groupSHINETSU CHEMICAL CO·Filed 1997·Granted Aug 24, 1999·91 cites·19 claims
- 0292US4564580APhotosensitive resin compositionKOGYO GIJUTSUIN·Filed 1984·Granted Jan 14, 1986·74 cites·7 claims
- 0390US4424325APhotosensitive materialDAIKIN IND LTD·Filed 1981·Granted Jan 3, 1984·78 cites·3 claims
- 0488US4365049AFluoroalkyl acrylate copolymer and composition containing the sameDAIKIN IND LTD·Filed 1981·Granted Dec 21, 1982·49 cites·3 claims
- 0587US6312869B1Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking groupSHINETSU CHEMICAL CO·Filed 2000·Granted Nov 6, 2001·20 cites·18 claims
- 0687US5876900AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1997·Granted Mar 2, 1999·68 cites·29 claims
- 0786US5882844AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1997·Granted Mar 16, 1999·60 cites·17 claims
- 0881US5939235APositive-working light-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Aug 17, 1999·49 cites·7 claims
- 0980US5364738ALight-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 1992·Granted Nov 15, 1994·35 cites·15 claims
- 1079US6335141B1Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking groupSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 1, 2002·13 cites·39 claims
- 1179US6114462AChemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking groupSHINETSU CHEMICAL CO·Filed 1999·Granted Sep 5, 2000·28 cites·9 claims
- 1276US5496678APhotosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generatorKANSAI PAINT CO LTD·Filed 1994·Granted Mar 5, 1996·26 cites·9 claims
- 1373US7015363B2Process for producing ether compoundKYOWA YUKA KK·Filed 2002·Granted Mar 21, 2006·11 cites·3 claims
- 1464US7368224B2Photopolymerizable compositionKYOWA HAKKO CHEMICAL CO LTD·Filed 2003·Granted May 6, 2008·3 cites·14 claims
- 1564US6245485B1Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 1998·Granted Jun 12, 2001·24 cites·7 claims
- 1663US5527659AChemical amplification resist composition containing photochemical acid generator, binder and squarylium compoundKYOWA HAKKO KOGYO KK·Filed 1994·Granted Jun 18, 1996·18 cites·11 claims
- 1763US4529783ANovel copolymer and photosensitive material containing the sameDAIKIN IND LTD·Filed 1983·Granted Jul 16, 1985·19 cites·5 claims
- 1862US5320931ALight-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 1991·Granted Jun 14, 1994·23 cites·9 claims
- 1961US5283265APhotopolymerizable rubberHAYAKAWA RUBBER·Filed 1988·Granted Feb 1, 1994·15 cites·7 claims
- 2058US5250385APhotopolymerizable compositionFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 5, 1993·14 cites·19 claims
- 2157US4474868APhoto polymerization initiator compositions having high sensitivityNIPPON OILS & FATS CO LTD·Filed 1983·Granted Oct 2, 1984·14 cites·20 claims
- 2256US5756258APhotopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compoundKYOWA HAKKO KOGYO KK·Filed 1995·Granted May 26, 1998·15 cites·1 claims
- 2355US5527656APositive type electrodeposition photoresist compositionsKANSAI PAINT CO LTD·Filed 1994·Granted Jun 18, 1996·10 cites·44 claims
- 2452US5053314APositively photosensitive polyimide compositionNITTO DENKO CORP·Filed 1990·Granted Oct 1, 1991·11 cites·3 claims
- 2550US7358030B2Process for producing ether compoundKYOWA YUKA KK·Filed 2005·Granted Apr 15, 2008·0 cites·6 claims
- 2650US5202216APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1990·Granted Apr 13, 1993·10 cites·17 claims
- 2749US10221325B2Ink composition and method for producing printed objectMIMAKI ENG CO LTD·Filed 2016·Granted Mar 5, 2019·0 cites·19 claims
- 2847US4515886APhotosensitive compositionsTOYO SODA MFG CO LTD·Filed 1984·Granted May 7, 1985·10 cites·17 claims
- 2946US5681685APhotopolymerizable composition containing squarylium compoundKYOWA HAKKO KOGYO KK·Filed 1995·Granted Oct 28, 1997·10 cites·2 claims
- 3041US5650259AProcesses for pattern formation using photosensitive compositions and liquid developmentKANSAI PAINT CO LTD·Filed 1995·Granted Jul 22, 1997·6 cites·3 claims
- 3140US7294448B2Composition sensitive to visible lightKYOWA HAKKO KOGYO KK·Filed 2003·Granted Nov 13, 2007·0 cites·5 claims
- 3240US4877714APhotosensitive aqueous emulsion resin composition of polystyrene or styrene copolymer particles containing photosensitive materialNIPPON PAINT CO LTD·Filed 1988·Granted Oct 31, 1989·7 cites·4 claims
- 3335US5702872AProcess for resist pattern formation using positive electrodeposition photoresist compositionsKANSAI PAINT CO LTD·Filed 1996·Granted Dec 30, 1997·3 cites·44 claims
- 3433US4118233APhotosensitive composition for printing screensMURAKAMI SCREEN KK·Filed 1976·Granted Oct 3, 1978·5 cites·12 claims
- 3532US6007965APhotopolymerizable compositions including squarylium compoundsFiled 1997·Granted Dec 28, 1999·3 cites·2 claims
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