Inventor · disambiguated record
Hugo Augustinus Joseph Cramer
Also filed as: CRAMER HUGO · CRAMER HUGO A J · CRAMER HUGO AUGUSTINUS J · CRAMER HUGO AUGUSTINUS JOSEPH
72 granted patents·14 pending applications·573 citations·filing 1977–2023
99Inventor score
Files withASML NETHERLANDS BV67CRAMER HUGO AUGUSTINUS JOSEPH6DEN BOEF ARIE JEFFREY4PHILIPS CORP2ABEN MARIA JOHANNA HENDRIKA1
Top patents by PatentIndex Score
86 records- 0198US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 0298US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 0397US12007697B2Method for process metrologyASML NETHERLANDS BV·Filed 2022·Granted Jun 11, 2024·4 cites·20 claims
- 0497US9081303B2Methods and scatterometers, lithographic systems, and lithographic processing cellsCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Jul 14, 2015·73 cites·24 claims
- 0597US8705007B2Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Apr 22, 2014·26 cites·27 claims
- 0696US10615084B2Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic valuesASML NETHERLANDS BV·Filed 2017·Granted Apr 7, 2020·9 cites·34 claims
- 0796US10488768B2Beat patterns for alignment on small metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Nov 26, 2019·10 cites·20 claims
- 0896US10453758B2Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portionASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·9 cites·29 claims
- 0996US8994944B2Methods and scatterometers, lithographic systems, and lithographic processing cellsASML NETHERLANDS BV·Filed 2014·Granted Mar 31, 2015·24 cites·16 claims
- 1096US7460237B1Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Dec 2, 2008·36 cites·16 claims
- 1196US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 1295US10546790B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·7 cites·36 claims
- 1395US7916284B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 29, 2011·23 cites·12 claims
- 1494US8830447B2Inspection method for lithographyDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 9, 2014·10 cites·20 claims
- 1593US11262661B2Metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Mar 1, 2022·4 cites·18 claims
- 1693US9952517B2Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·6 cites·19 claims
- 1792US8189195B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2007·Granted May 29, 2012·15 cites·33 claims
- 1892US6809797B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Oct 26, 2004·71 cites·34 claims
- 1990US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 2090US9128065B2Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection methodASML NETHERLANDS BV·Filed 2014·Granted Sep 8, 2015·5 cites·20 claims
- 2189US11940739B2Metrology apparatusASML NETHERLANDS BV·Filed 2021·Granted Mar 26, 2024·1 cites·19 claims
- 2289US11101184B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 2388US12322660B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2023·Granted Jun 3, 2025·0 cites·20 claims
- 2488US9436099B2Lithographic focus and dose measurement using a 2-D targetASML NETHERLANDS BV·Filed 2014·Granted Sep 6, 2016·5 cites·11 claims
- 2587US12142535B2Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetryASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2024·2 cites·22 claims
- 2687US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 2787US8868387B2Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatusDEN BOEF ARIE JEFFREY·Filed 2008·Granted Oct 21, 2014·28 cites·40 claims
- 2886US10180628B2Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 15, 2019·4 cites·21 claims
- 2986US9964853B2Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted May 8, 2018·6 cites·27 claims
- 3085US8891061B2Lithographic focus and dose measurement using a 2-D targetLEEWIS CHRISTIAN MARINUS·Filed 2009·Granted Nov 18, 2014·10 cites·18 claims
- 3184US11385551B2Method for process metrologyASML NETHERLANDS BV·Filed 2017·Granted Jul 12, 2022·2 cites·21 claims
- 3284US8830472B2Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatusDEN BOEF ARIE JEFFREY·Filed 2009·Granted Sep 9, 2014·8 cites·15 claims
- 3383US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 3482US10845713B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Nov 24, 2020·2 cites·20 claims
- 3582US7916927B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Mar 29, 2011·11 cites·20 claims
- 3680US11728224B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
- 3780US11009343B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·2 cites·15 claims
- 3880US7738103B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a parameter of a target patternASML NETHERLANDS BV·Filed 2008·Granted Jun 15, 2010·9 cites·12 claims
- 3979US10627213B2Statistical hierarchical reconstruction from metrology dataASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·2 cites·20 claims
- 4079US10317805B2Method for monitoring a characteristic of illumination from a metrology apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·2 cites·19 claims
- 4179US9182682B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2009·Granted Nov 10, 2015·9 cites·13 claims
- 4278US9977340B2Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods and apparatusABEN MARIA JOHANNA HENDRIKA·Filed 2011·Granted May 22, 2018·9 cites·17 claims
- 4377US8294907B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2006·Granted Oct 23, 2012·5 cites·12 claims
- 4477US7605907B2Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration methodASML NETHERLANDS BV·Filed 2007·Granted Oct 20, 2009·6 cites·18 claims
- 4576US10955756B2Method of measuring a target, metrology apparatus, lithographic cell, and targetASML NETHERLANDS BV·Filed 2018·Granted Mar 23, 2021·1 cites·20 claims
- 4675US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 4775US11650047B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 4875US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 4974US11101185B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 5074US8520212B2Scatterometry method and measurement system for lithographyCOENE WILLEM MARIE JULIA MARCEL·Filed 2009·Granted Aug 27, 2013·4 cites·20 claims
Showing the top 50 of 86 patent records by PatentIndex Score.
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