Inventor · disambiguated record
Tsunehiro Nishi
Also filed as: NISHI TSUNEHIRO
88 granted patents·26 pending applications·1,624 citations·filing 1996–2024
99Inventor score
Files withSHINETSU CHEMICAL CO83SAMSUNG ELECTRONICS CO LTD19WATANABE TAKERU3TAKEMURA KATSUYA2EUDYNA DEVICES INC1
Top patents by PatentIndex Score
114 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0398US6280898B1Lactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Aug 28, 2001·229 cites·21 claims
- 0497US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0596US7981589B2Fluorinated monomer, fluorinated polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Jul 19, 2011·22 cites·5 claims
- 0696US6830866B2Resist composition and patterning processSHI ETSU CHEMICAL CO LTD·Filed 2002·Granted Dec 14, 2004·77 cites·14 claims
- 0796US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 0892USRE41580ELactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 24, 2010·8 cites·48 claims
- 0992US7611821B2Positive resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Nov 3, 2009·15 cites·2 claims
- 1092US6048661APolymeric compounds, chemically amplified positive type resist materials and process for pattern formationSHINETSU CHEMICAL CO·Filed 1998·Granted Apr 11, 2000·80 cites·19 claims
- 1191US7833694B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 16, 2010·9 cites·8 claims
- 1289US8329384B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Dec 11, 2012·10 cites·10 claims
- 1389US7871752B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 18, 2011·11 cites·5 claims
- 1488US7868199B2Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning processEUDYNA DEVICES INC·Filed 2007·Granted Jan 11, 2011·7 cites·9 claims
- 1587US7718342B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 18, 2010·9 cites·15 claims
- 1687US6512067B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·23 cites·18 claims
- 1787US6444396B1Ester compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 3, 2002·24 cites·19 claims
- 1887US6413695B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·18 cites·15 claims
- 1986US8658346B2Pattern forming process, chemically amplified positive resist composition, and resist-modifying compositionWATANABE TAKERU·Filed 2010·Granted Feb 25, 2014·6 cites·15 claims
- 2086US6946233B2Polymer, resist material and patterning methodSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 20, 2005·25 cites·14 claims
- 2186US6605408B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 12, 2003·29 cites·9 claims
- 2286US6492090B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 10, 2002·25 cites·5 claims
- 2385US6703183B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 9, 2004·23 cites·4 claims
- 2484US8247166B2Double patterning processTAKEMURA KATSUYA·Filed 2009·Granted Aug 21, 2012·7 cites·8 claims
- 2583US6673518B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jan 6, 2004·20 cites·4 claims
- 2682US7090961B2Photo acid generator, chemical amplification resist material and pattern formation methodSHINETSU CHEMICAL CO·Filed 2003·Granted Aug 15, 2006·18 cites·15 claims
- 2782US6673515B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 6, 2004·20 cites·20 claims
- 2881US6399274B1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jun 4, 2002·20 cites·8 claims
- 2980US8062831B2Carboxyl-containing lactone compound, polymer, resist composition, and patterning processSHINACHI SATOSHI·Filed 2009·Granted Nov 22, 2011·7 cites·6 claims
- 3079US11327398B2Photoresist compositions and methods for fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 10, 2022·2 cites·20 claims
- 3179US7211367B2Photo acid generator, chemical amplification resist materialSHINETSU CHEMICAL CO·Filed 2006·Granted May 1, 2007·4 cites·8 claims
- 3279US6794111B2Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparationSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 21, 2004·16 cites·26 claims
- 3378US6586157B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 1, 2003·12 cites·16 claims
- 3478US6472543B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Oct 29, 2002·7 cites·4 claims
- 3577US6509135B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 21, 2003·16 cites·4 claims
- 3676US7618765B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 17, 2009·14 cites·4 claims
- 3776US7541133B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 2, 2009·4 cites·7 claims
- 3876US6962767B2Acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 8, 2005·10 cites·21 claims
- 3975US6524765B1Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Feb 25, 2003·14 cites·13 claims
- 4075US6500961B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 31, 2002·6 cites·3 claims
- 4174US7985528B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Jul 26, 2011·3 cites·6 claims
- 4274US7727704B2Positive resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 1, 2010·3 cites·4 claims
- 4374US6566038B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted May 20, 2003·13 cites·21 claims
- 4474US6274286B1Resist compositionsSHINETSU CHEMICAL CO·Filed 1998·Granted Aug 14, 2001·46 cites·52 claims
- 4573US8426105B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Apr 23, 2013·2 cites·11 claims
- 4673US7157207B2Polymer, resist material and patterning processingSHINETSU CHEMICAL CO·Filed 2004·Granted Jan 2, 2007·12 cites·7 claims
- 4773US6596463B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 22, 2003·8 cites·25 claims
- 4873US6030746ADi- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1997·Granted Feb 29, 2000·13 cites·30 claims
- 4971US6403822B2Ester compounds having alicyclic structure and method for preparing sameSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 11, 2002·5 cites·14 claims
- 5070US7598015B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Oct 6, 2009·2 cites·19 claims
Showing the top 50 of 114 patent records by PatentIndex Score.
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