Inventor · disambiguated record
Hua-Yu Liu
Also filed as: LIU HUA · LIU HUA-YU
31 granted patents·3 pending applications·581 citations·filing 1986–2017
97Inventor score
Files withNUMERICAL TECH INC12LIU HUA-YU5ASML NETHERLANDS BV4SYNOPSYS INC4DONGFANG JINGYUAN ELECTRON LTD2
Top patents by PatentIndex Score
34 records- 0197US8065636B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2010·Granted Nov 22, 2011·18 cites·24 claims
- 0297US7747978B2System and method for creating a focus-exposure model of a lithography processASML NETHERLANDS BV·Filed 2006·Granted Jun 29, 2010·37 cites·43 claims
- 0396US8438508B2Pattern selection for full-chip source and mask optimizationLIU HUA-YU·Filed 2010·Granted May 7, 2013·36 cites·22 claims
- 0495US8245160B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2011·Granted Aug 14, 2012·11 cites·21 claims
- 0595US6684382B2Microloading effect correctionNUMERICAL TECH INC·Filed 2001·Granted Jan 27, 2004·72 cites·16 claims
- 0695US6523165B2Alternating phase shift mask design conflict resolutionNUMERICAL TECH INC·Filed 2001·Granted Feb 18, 2003·85 cites·26 claims
- 0794US9183324B2Pattern selection for full-chip source and mask optimizationASML NETHERLANDS BV·Filed 2013·Granted Nov 10, 2015·6 cites·20 claims
- 0894US8739082B2Method of pattern selection for source and mask optimizationLIU HUA-YU·Filed 2010·Granted May 27, 2014·11 cites·7 claims
- 0994US8543947B2Selection of optimum patterns in a design layout based on diffraction signature analysisLIU HUA-YU·Filed 2010·Granted Sep 24, 2013·15 cites·22 claims
- 1094US6670082B2System and method for correcting 3D effects in an alternating phase-shifting maskNUMERICAL TECH INC·Filed 2001·Granted Dec 30, 2003·54 cites·24 claims
- 1191US6566019B2Using double exposure effects during phase shifting to control line end shorteningNUMERICAL TECH INC·Filed 2001·Granted May 20, 2003·46 cites·31 claims
- 1281US5254438ASingle pass compensation for electron beam proximity effectHEWLETT PACKARD CO·Filed 1992·Granted Oct 19, 1993·39 cites·12 claims
- 1380US7082596B2Simulation-based selection of evaluation points for model-based optical proximity correctionSYNOPSYS INC·Filed 2002·Granted Jul 25, 2006·17 cites·27 claims
- 1479US6553560B2Alleviating line end shortening in transistor endcaps by extending phase shiftersNUMERICAL TECH INC·Filed 2001·Granted Apr 22, 2003·19 cites·56 claims
- 1578US6704921B2Automated flow in PSM phase assignmentNUMERICAL TECH INC·Filed 2002·Granted Mar 9, 2004·25 cites·22 claims
- 1677US6664009B2Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edgesNUMERICAL TECH INC·Filed 2001·Granted Dec 16, 2003·15 cites·34 claims
- 1774US6944844B2System and method to determine impact of line end shorteningSYNOPSYS INC·Filed 2002·Granted Sep 13, 2005·20 cites·28 claims
- 1873US9934350B2Pattern selection for full-chip source and mask optimizationASML NETHERLANDS BV·Filed 2015·Granted Apr 3, 2018·1 cites·20 claims
- 1968US10133838B2Guided defect detection of integrated circuitsDONGFANG JINGYUAN ELECTRON LTD·Filed 2017·Granted Nov 20, 2018·1 cites·20 claims
- 2067US8887104B2Correction for flare effects in lithography systemLIU HUA-YU·Filed 2011·Granted Nov 11, 2014·1 cites·16 claims
- 2165US7178128B2Alternating phase shift mask design conflict resolutionSYNOPSYS INC·Filed 2002·Granted Feb 13, 2007·8 cites·14 claims
- 2265US6573010B2Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulatorNUMERICAL TECH INC·Filed 2001·Granted Jun 3, 2003·8 cites·23 claims
- 2362US6859918B2Alleviating line end shortening by extending phase shiftersNUMERICAL TECHNOLOGIES·Filed 2002·Granted Feb 22, 2005·7 cites·18 claims
- 2462US6830854B2System and method for correcting 3D effects in an alternating phase-shifting maskNUMERICAL TECH INC·Filed 2003·Granted Dec 14, 2004·5 cites·2 claims
- 2560US6813759B2Hybrid optical proximity correction for alternating aperture phase shifting designsNUMERICAL TECH INC·Filed 2002·Granted Nov 2, 2004·6 cites·25 claims
- 2657US10423745B2Correction for flare effects in lithography systemASML NETHERLANDS BV·Filed 2014·Granted Sep 24, 2019·0 cites·24 claims
- 2754US7251377B2Cell library that can automatically avoid forbidden pitchesSYNOPSYS INC·Filed 2003·Granted Jul 31, 2007·3 cites·23 claims
- 2849US4988284AMethod for compensating for the E-beam proximity effectHEWLETT PACKARD CO·Filed 1986·Granted Jan 29, 1991·10 cites·9 claims
- 2946USD689039SStereo setLIU HUA-YU·Filed 2012·Granted Sep 3, 2013·5 cites·1 claims
- 3038US10565702B2Dynamic updates for the inspection of integrated circuitsDONGFANG JINGYUAN ELECTRON LTD·Filed 2017·Granted Feb 18, 2020·0 cites·18 claims
- 3138US9940427B2Lens heating aware source mask optimization for advanced lithographyCROUSE MICHAEL MATTHEW M·Filed 2013·Granted Apr 10, 2018·0 cites·20 claims
- 3236US2003121021A1System and method for determining manufacturing error enhancement factorNUMERICAL TECH INC·Filed 2001·Application pending·0 cites
- 3336US2003192015A1Method and apparatus to facilitate test pattern design for model calibration and proximity correctionNUMERICAL TECH INC·Filed 2002·Application pending·0 cites
- 3424US2019074659A1Method for reducing self-mixing interference effect of laser systemWUXI MILEWAVE PHOTONICS TECH CO LTD·Filed 2017·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →