Inventor · disambiguated record
Hiroshi Hanekawa
Also filed as: HANEKAWA HIROSHI
19 granted patents·7 pending applications·9 citations·filing 2014–2025
88Inventor score
Top patents by PatentIndex Score
26 records- 0193US11698580B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted Jul 11, 2023·2 cites·17 claims
- 0285US12235575B2Reflective mask blank for EUV lithography and substrate with conductive filmAGC INC·Filed 2024·Granted Feb 25, 2025·0 cites·28 claims
- 0384US10241390B2Reflective mask blank and process for producing the reflective mask blankAGC INC·Filed 2017·Granted Mar 26, 2019·5 cites·17 claims
- 0483US11934093B2Reflective mask blank for EUV lithography and substrate with conductive filmAGC INC·Filed 2023·Granted Mar 19, 2024·0 cites·18 claims
- 0582US11150550B2Reflective mask blank and reflective maskAGC INC·Filed 2018·Granted Oct 19, 2021·2 cites·10 claims
- 0681US12216398B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Feb 4, 2025·0 cites·9 claims
- 0780US12038685B2Reflective mask blank for EUV lithographyAGC INC·Filed 2023·Granted Jul 16, 2024·0 cites·18 claims
- 0880US2025355340A1Reflective mask blank, method for producing reflective mask blank, reflective mask, and method for producing reflective maskAGC INC·Filed 2025·Application pending·0 cites
- 0979US12124164B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Oct 22, 2024·0 cites·7 claims
- 1077US2025004360A1Reflective mask blank and reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 1176US2025147406A1Reflective mask blank for euv lithography and substrate with conductive filmAGC INC·Filed 2025·Application pending·0 cites
- 1272US11914283B2Reflective mask blank and reflective maskAGC INC·Filed 2022·Granted Feb 27, 2024·0 cites·9 claims
- 1369US12032280B2Reflective mask blank, reflective mask, and method for manufacturing reflective maskAGC INC·Filed 2023·Granted Jul 9, 2024·0 cites·18 claims
- 1469US11703751B2Reflective mask blank and reflective maskAGC INC·Filed 2021·Granted Jul 18, 2023·0 cites·4 claims
- 1569US2024201576A1Reflective mask blank for euv lithographyAGC INC·Filed 2024·Application pending·0 cites
- 1667US2015103399A1Method of producing glass substrate and glass substrateASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 1766US11982935B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted May 14, 2024·0 cites·20 claims
- 1865US2025036020A1Reflective mask blank, reflective mask blank manufacturing method, reflective mask, and reflective mask manufacturing methodAGC INC·Filed 2024·Application pending·0 cites
- 1962US10239783B2Method of producing glass substrate and glass substrateASAHI GLASS CO LTD·Filed 2017·Granted Mar 26, 2019·0 cites·12 claims
- 2061US9922805B2Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma sourceASAHI GLASS CO LTD·Filed 2015·Granted Mar 20, 2018·0 cites·18 claims
- 2157US9988303B2Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrateASAHI GLASS CO LTD·Filed 2016·Granted Jun 5, 2018·0 cites·14 claims
- 2256US10204767B2Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma sourceASAHI GLASS CO LTD·Filed 2018·Granted Feb 12, 2019·0 cites·20 claims
- 2353US10634887B2Protective film, reflective member, and method for producing protective filmAGC INC·Filed 2015·Granted Apr 28, 2020·0 cites·18 claims
- 2448US11036127B2Reflective mask blank and reflective maskAGC INC·Filed 2018·Granted Jun 15, 2021·0 cites·9 claims
- 2546US9927693B2Reflective mask blank and process for producing the reflective mask blankASAHI GLASS CO LTD·Filed 2016·Granted Mar 27, 2018·0 cites·10 claims
- 2637US2017283952A1Plasma cvd apparatusASAHI GLASS CO LTD·Filed 2017·Application pending·0 cites
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