Inventor · disambiguated record
James R. B. Elmer
Also filed as: ELMER JAMES · ELMER JAMES R B
11 granted patents·2 pending applications·98 citations·filing 2001–2009
88Inventor score
Top patents by PatentIndex Score
13 records- 0186US6856029B1Process independent alignment marksLSI LOGIC CORP·Filed 2001·Granted Feb 15, 2005·42 cites·6 claims
- 0281US6710851B1Multi pattern reticleLSI LOGIC CORP·Filed 2002·Granted Mar 23, 2004·25 cites·11 claims
- 0376US7538040B2Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafersNANTERO INC·Filed 2005·Granted May 26, 2009·4 cites·15 claims
- 0470US6818516B1Selective high k dielectrics removalLSI LOGIC CORP·Filed 2003·Granted Nov 16, 2004·14 cites·20 claims
- 0569US7911034B2Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafersNANTERO INC·Filed 2009·Granted Mar 22, 2011·2 cites·16 claims
- 0658US7095483B2Process independent alignment marksLSI LOGIC CORP·Filed 2004·Granted Aug 22, 2006·7 cites·7 claims
- 0752US6964924B1Integrated circuit process monitoring and metrology systemLSI LOGIC CORP·Filed 2001·Granted Nov 15, 2005·3 cites·8 claims
- 0847US7115425B2Integrated circuit process monitoring and metrology systemLSI LOGIC CORP·Filed 2005·Granted Oct 3, 2006·0 cites·6 claims
- 0941US7915122B2Self-aligned cell integration schemeNANTERO INC·Filed 2005·Granted Mar 29, 2011·1 cites·2 claims
- 1041US2006292716A1Use selective growth metallization to improve electrical connection between carbon nanotubes and electrodesLSI LOGIC CORP·Filed 2006·Application pending·0 cites
- 1138US2005064716A1Plasma removal of high k metal oxideFiled 2004·Application pending·0 cites
- 1235US7016041B2Reticle overlay correctionLSI LOGIC CORP·Filed 2002·Granted Mar 21, 2006·0 cites·20 claims
- 1335US6472316B1Photolithography overlay controlLSI LOGIC CORP·Filed 2001·Granted Oct 29, 2002·0 cites·20 claims
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