Inventor · disambiguated record
Keiichiro Tounai
Also filed as: TOUNAI KEIICHIRO
9 granted patents·251 citations·filing 1993–2004
90Inventor score
Top patents by PatentIndex Score
9 records- 0188US5627083AMethod of fabricating semiconductor device including step of forming superposition error measuring patternsNEC CORP·Filed 1995·Granted May 6, 1997·106 cites·9 claims
- 0284US5357312AIlluminating system in exposure apparatus for photolithographyNEC CORP·Filed 1993·Granted Oct 18, 1994·47 cites·6 claims
- 0375US7058923B2Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patternsNEC ELECTRONICS CORP·Filed 2001·Granted Jun 6, 2006·15 cites·3 claims
- 0475US6570174B1Optical proximity effect correcting method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patternsNEC ELECTRONICS CORP·Filed 1999·Granted May 27, 2003·40 cites·5 claims
- 0573US6403477B1Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reductionNEC CORP·Filed 2000·Granted Jun 11, 2002·17 cites·16 claims
- 0668US6519759B2Photomask pattern shape correction method and corrected photomaskNEC CORP·Filed 2001·Granted Feb 11, 2003·10 cites·20 claims
- 0748US7974457B2Method and program for correcting and testing mask pattern for optical proximity effectRENESAS ELECTRONICS CORP·Filed 2004·Granted Jul 5, 2011·2 cites·28 claims
- 0843US5871874AMask pattern forming method capable of correcting errors by proximity effect and developing processNEC CORP·Filed 1997·Granted Feb 16, 1999·9 cites·6 claims
- 0935US6174633B1Method for correcting photocontiguous effect during manufacture of semiconductor deviceNEC CORP·Filed 1999·Granted Jan 16, 2001·5 cites·10 claims
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