Inventor · disambiguated record
Teresa Brugarolas Brufau
Also filed as: BRUGAROLAS BRUFAU TERESA
15 granted patents·22 citations·filing 2015–2021
86Inventor score
Top patents by PatentIndex Score
15 records- 0192US9457449B1Chemical mechanical polishing pad with composite polishing layerROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 4, 2016·9 cites·10 claims
- 0290US9539694B1Composite polishing layer chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jan 10, 2017·8 cites·8 claims
- 0381US10293456B2Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted May 21, 2019·3 cites·10 claims
- 0472US9630293B2Chemical mechanical polishing pad composite polishing layer formulationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Apr 25, 2017·2 cites·11 claims
- 0559US11813713B2Chemical mechanical polishing pad and polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Nov 14, 2023·0 cites·10 claims
- 0659US11806830B2Formulations for chemical mechanical polishing pads and CMP pads made therewithROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Nov 7, 2023·0 cites·10 claims
- 0758US10625393B2Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Apr 21, 2020·0 cites·9 claims
- 0848US12064845B2Formulations for chemical mechanical polishing pads with high planarization efficiency and CMP pads made therewithROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Aug 20, 2024·0 cites·10 claims
- 0947US12064846B2Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewithROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Aug 20, 2024·0 cites·10 claims
- 1044US10144115B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Dec 4, 2018·0 cites·9 claims
- 1142US10105825B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 23, 2018·0 cites·9 claims
- 1242US10092998B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 9, 2018·0 cites·10 claims
- 1340US10011002B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jul 3, 2018·0 cites·10 claims
- 1439US9776300B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 3, 2017·0 cites·10 claims
- 1537US9586305B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Mar 7, 2017·0 cites·9 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →