Inventor · disambiguated record
Chong-Cheng Fu
Also filed as: FU CHONG-CHENG
11 granted patents·2 pending applications·355 citations·filing 1982–2011
92Inventor score
Files withFREESCALE SEMICONDUCTOR INC2HALL MARK D2LUCENT TECHNOLOGIES INC2MOTOROLA INC2UNIV LELAND STANFORD JUNIOR2
Top patents by PatentIndex Score
13 records- 0191US5849440AProcess for producing and inspecting a lithographic reticle and fabricating semiconductor devices using sameMOTOROLA INC·Filed 1997·Granted Dec 15, 1998·94 cites·18 claims
- 0290US4519260AUltrasonic transducers and applications thereofUNIV LELAND STANFORD JUNIOR·Filed 1984·Granted May 28, 1985·52 cites·2 claims
- 0389US6586160B2Method for patterning resistMOTOROLA INC·Filed 2001·Granted Jul 1, 2003·43 cites·18 claims
- 0487US7235473B2Dual silicide semiconductor fabrication processFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jun 26, 2007·15 cites·14 claims
- 0583US5057462ACompensation of lithographic and etch proximity effectsAT & T BELL LAB·Filed 1989·Granted Oct 15, 1991·40 cites·12 claims
- 0681US5891784ATransistor fabrication methodLUCENT TECHNOLOGIES INC·Filed 1995·Granted Apr 6, 1999·70 cites·6 claims
- 0774US4431936ATransducer structure for generating uniform and focused ultrasonic beams and applications thereofUNIV LELAND STANFORD JUNIOR·Filed 1982·Granted Feb 14, 1984·28 cites·6 claims
- 0852US8062953B2Semiconductor devices with extended active regionsHALL MARK D·Filed 2008·Granted Nov 22, 2011·0 cites·17 claims
- 0951US8502324B2Semiconductor wafer having scribe lane alignment marks for reducing crack propagationPOL VICTOR·Filed 2009·Granted Aug 6, 2013·3 cites·18 claims
- 1046US2012007155A1Semiconductor devices with extended active regionsHALL MARK D·Filed 2011·Application pending·0 cites
- 1143US7132327B2Decoupled complementary mask patterning transfer methodFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Nov 7, 2006·2 cites·18 claims
- 1243US6168904B1Integrated circuit fabricationLUCENT TECHNOLOGIES INC·Filed 1997·Granted Jan 2, 2001·8 cites·18 claims
- 1336US2008085609A1Method for protecting high-topography regions during patterning of low-topography regionsVASEK JAMES E·Filed 2006·Application pending·0 cites
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