Inventor · disambiguated record
Atsuko Noya
Also filed as: NOYA ATSUKO
8 granted patents·13 pending applications·12 citations·filing 2005–2025
77Inventor score
Files withMERCK PATENT GMBH16AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1AZ ELECTRONIC MAT LUXEMBOURG SARL1AZ ELECTRONIC MATERIALS LUXEMBOURG SARL1AZ ELECTRONIC MATERIALS USA1
Top patents by PatentIndex Score
21 records- 0192US11467494B2Positive type photosensitive polysiloxane compositionMERCK PATENT GMBH·Filed 2020·Granted Oct 11, 2022·2 cites·11 claims
- 0280US7867559B2Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatusAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Jan 11, 2011·8 cites·17 claims
- 0373US9164386B2Negative-working photosensitive siloxane compositionAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2013·Granted Oct 20, 2015·2 cites·12 claims
- 0471US2024392104A1Composition, cured film, device including the same, and manufacturing method for the cured filmMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 0568US2025244667A1CompositionMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 0665US2025101162A1CompositionMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 0760US11579530B2Negative type photosensitive compositionMERCK PATENT GMBH·Filed 2020·Granted Feb 14, 2023·0 cites·8 claims
- 0857US2025206917A1CompositionMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 0957US2025136765A1Polysiloxane formulationMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1056US2025199403A1Composition including alkaline-soluble polymer and colorantMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 1156US2025021000A1CompositionMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1255US2022403216A1Adhesion promoting composition and method for producing laminate, and film forming composition and method for producing filmMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 1354US2024142875A1Negative type photosensitive compositionMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1453US11579527B2Negative type photosensitive composition comprising black colorantMERCK PATENT GMBH·Filed 2020·Granted Feb 14, 2023·0 cites·11 claims
- 1550US11028270B2Black matrix composition, black matrix, and black matrix production methodSHARP KK·Filed 2017·Granted Jun 8, 2021·0 cites·7 claims
- 1650US2023107892A1Negative type photosensitive composition comprising reflectance modifierMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1748US10719013B2Composition for black matrix and method for producing black matrix using the sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Jul 21, 2020·0 cites·23 claims
- 1848US2023320140A1DeviceMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1946US9684240B2Negative-working photosensitive siloxane compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Jun 20, 2017·0 cites·16 claims
- 2045US2022267639A1Gate insulating film forming compositionMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 2144US2022267641A1Low-temperature curable negative type photosensitive compositionMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →