Inventor · disambiguated record
Chang-Sup Mun
Also filed as: MUN CHANG-SUP
10 granted patents·6 pending applications·44 citations·filing 2004–2019
86Inventor score
Top patents by PatentIndex Score
16 records- 0184US8580648B2Capacitor having an electrode structure, method of manufacturing a capacitor having an electrode structure and semiconductor device having an electrode structureCHOI SUK-HUN·Filed 2011·Granted Nov 12, 2013·8 cites·2 claims
- 0283US8822287B2Methods of manufacturing semiconductor devicesKIM HYO-JUNG·Filed 2011·Granted Sep 2, 2014·7 cites·10 claims
- 0380US7344999B2Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Mar 18, 2008·7 cites·26 claims
- 0478US7745338B2Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 29, 2010·7 cites·34 claims
- 0578US7435301B2Cleaning solution of silicon germanium layer and cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 14, 2008·6 cites·6 claims
- 0673US7354868B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 8, 2008·4 cites·16 claims
- 0773US7309683B2Cleaning composition and method of cleaning a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Dec 18, 2007·4 cites·12 claims
- 0871US10910237B2Operating method for wet etching system and related systemSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Feb 2, 2021·1 cites·20 claims
- 0950US8058180B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureKWON DOO-WON·Filed 2008·Granted Nov 15, 2011·0 cites·15 claims
- 1050US2009023265A1Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor deviceMUN CHANG-SUP·Filed 2008·Application pending·0 cites
- 1146US2004242446A1Cleaning agent including a corrosion inhibitor used in a process of forming a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1245US2006183297A1Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor deviceMUN CHANG-SUP·Filed 2005·Application pending·0 cites
- 1342US8592269B2Method of manufacturing gate structure and method of manufacturing semiconductor device including the sameHWANG KI-HYUN·Filed 2010·Granted Nov 26, 2013·0 cites·16 claims
- 1442US2007020841A1Method of manufacturing gate structure and method of manufacturing semiconductor device including the sameHWANG KI-HYUN·Filed 2006·Application pending·0 cites
- 1541US2006027252A1Methods of processing substrates during semiconductor manufacturing processesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 1633US2012108048A1Three-dimensional semiconductor devices and methods of fabricating the sameLIM JONG HEUN·Filed 2011·Application pending·0 cites
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