Inventor · disambiguated record
Eiji Setoyama
Also filed as: SETOYAMA EIJI
13 granted patents·1 pending application·454 citations·filing 1986–2001
94Inventor score
Files withHITACHI LTD14
Top patents by PatentIndex Score
14 records- 0192US6084356APlasma processing apparatus with a dielectric body in the waveguideHITACHI LTD·Filed 1998·Granted Jul 4, 2000·87 cites·9 claims
- 0292US5116482AFilm forming system using high frequency power and power supply unit for the sameHITACHI LTD·Filed 1990·Granted May 26, 1992·88 cites·6 claims
- 0387US4865709AMagnetron sputter apparatus and method for forming films by using the same apparatusHITACHI LTD·Filed 1988·Granted Sep 12, 1989·38 cites·17 claims
- 0486US6196155B1Plasma processing apparatus and method of cleaning the apparatusHITACHI LTD·Filed 1999·Granted Mar 6, 2001·65 cites·5 claims
- 0576US4673482ASputtering apparatusHITACHI LTD·Filed 1986·Granted Jun 16, 1987·33 cites·7 claims
- 0669US5085755ASputtering apparatus for forming thin filmsHITACHI LTD·Filed 1989·Granted Feb 4, 1992·16 cites·7 claims
- 0765US5429729ASputtering apparatus, device for exchanging target and method for the sameHITACHI LTD·Filed 1990·Granted Jul 4, 1995·25 cites·11 claims
- 0865US4986890AThin film deposition systemHITACHI LTD·Filed 1990·Granted Jan 22, 1991·40 cites·17 claims
- 0953US4911815ASputtering apparatus for production of thin films of magnetic materialsHITACHI LTD·Filed 1988·Granted Mar 27, 1990·16 cites·3 claims
- 1050US6224676B1Gas supply apparatus and film forming apparatusHITACHI LTD·Filed 1999·Granted May 1, 2001·18 cites·6 claims
- 1149US5783055AMulti-chamber sputtering apparatusHITACHI LTD·Filed 1996·Granted Jul 21, 1998·17 cites·4 claims
- 1243US2001001185A1Plasma processing apparatus and method of cleaning the apparatusHITACHI LTD·Filed 2001·Application pending·0 cites
- 1330US5061356AVacuum treatment apparatus and vacuum treatment methodHITACHI LTD·Filed 1990·Granted Oct 29, 1991·8 cites·10 claims
- 1429US5376777AControl apparatus and method for a substrate tray on an in-line sputtering apparatusHITACHI LTD·Filed 1991·Granted Dec 27, 1994·3 cites·10 claims
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