Inventor · disambiguated record
Manami Oshio
Also filed as: OSHIO MANAMI
3 granted patents·8 pending applications·2 citations·filing 2016–2023
50Inventor score
Files withTOKUYAMA CORP11
Top patents by PatentIndex Score
11 records- 0175US10690943B2Laminate and optical article comprising the sameTOKUYAMA CORP·Filed 2016·Granted Jun 23, 2020·2 cites·13 claims
- 0255US12288693B2Etching solution, method for treating substrate with the etching solution, and method for manufacturing semiconductor deviceTOKUYAMA CORP·Filed 2023·Granted Apr 29, 2025·0 cites·7 claims
- 0348US12466999B2Silicon etching liquid, and method for producing silicon device and method for processing silicon substrate, each using said etching liquidTOKUYAMA CORP·Filed 2021·Granted Nov 11, 2025·0 cites·6 claims
- 0447US2023136986A1Silicon etching liquid containing aromatic aldehydeTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 0544US2024124775A1Silicon etching liquid, and method for producing silicon devices and method for processing substrates, each using said etching liquidTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 0644US2024240083A1Etching solution, method of manufacturing silicon device and method of treating substrate using the etching solutionTOKUYAMA CORP·Filed 2023·Application pending·0 cites
- 0743US2021269716A1Silicon Etching Solution, Method for Manufacturing Silicon Device Using Same, and Substrate Treatment MethodTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 0842US2023287270A1Silicon etching liquid, and method for producing silicon device and method for processing silicon substrate, each using said etching liquidTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 0942US2024112917A1Method for processing substrate, and method for manufacturing silicon device comprising said processing methodTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 1039US2021040335A1Coating composition and optical article having a hard coat filmTOKUYAMA CORP·Filed 2019·Application pending·0 cites
- 1138US2022041931A1Silicon Etching LiquidTOKUYAMA CORP·Filed 2019·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →