Inventor · disambiguated record
Gary N. Taylor
Also filed as: TAYLOR GARY N · TAYLOR GARY NEWTON
34 granted patents·3 pending applications·918 citations·filing 1974–2003
98Inventor score
Top patents by PatentIndex Score
37 records- 0193US6057083APolymers and photoresist compositionsSHIPLEY CO LLC·Filed 1997·Granted May 2, 2000·76 cites·26 claims
- 0293US5750312AProcess for fabricating a deviceLUCENT TECHNOLOGIES INC·Filed 1994·Granted May 12, 1998·83 cites·19 claims
- 0392US5736424ADevice fabrication involving planarizationLUCENT TECHNOLOGIES INC·Filed 1996·Granted Apr 7, 1998·175 cites·11 claims
- 0491US4061829ANegative resist for X-ray and electron beam lithography and method of using sameBELL TELEPHONE LABOR INC·Filed 1976·Granted Dec 6, 1977·45 cites·41 claims
- 0589US4396704ASolid state devices produced by organometallic plasma developed resistsBELL TELEPHONE LABOR INC·Filed 1981·Granted Aug 2, 1983·49 cites·10 claims
- 0688US4683024ADevice fabrication method using spin-on glass resinsAMERICAN TELEPHONE & TELEGRAPH·Filed 1985·Granted Jul 28, 1987·51 cites·7 claims
- 0782US4377437ADevice lithography by selective ion implantationBELL TELEPHONE LABOR INC·Filed 1981·Granted Mar 22, 1983·51 cites·10 claims
- 0881US6136501APolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 1998·Granted Oct 24, 2000·60 cites·30 claims
- 0979US6858379B2Photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2002·Granted Feb 22, 2005·16 cites·8 claims
- 1078US4185202AX-ray lithographyBELL TELEPHONE LABOR INC·Filed 1977·Granted Jan 22, 1980·24 cites·20 claims
- 1177US6884564B2Fluorinated polymers having ester groups and photoresists for microlithographyDU PONT·Filed 2002·Granted Apr 26, 2005·13 cites·37 claims
- 1276US6379861B1Polymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Apr 30, 2002·14 cites·23 claims
- 1376US5487967ASurface-imaging technique for lithographic processes for device fabricationAT & T CORP·Filed 1995·Granted Jan 30, 1996·39 cites·22 claims
- 1471US5212047AResist material and process for useDU PONT·Filed 1992·Granted May 18, 1993·23 cites·16 claims
- 1567US5215867AMethod with gas functionalized plasma developed layerAT & T BELL LAB·Filed 1987·Granted Jun 1, 1993·20 cites·53 claims
- 1665US5876899APhotoresist compositionsSHIPLEY CO LLC·Filed 1996·Granted Mar 2, 1999·24 cites·29 claims
- 1764US5550007ASurface-imaging technique for lithographic processes for device fabricationLUCENT TECHNOLOGIES INC·Filed 1993·Granted Aug 27, 1996·21 cites·17 claims
- 1863US4400235AEtching apparatus and methodBELL TELEPHONE LABOR INC·Filed 1982·Granted Aug 23, 1983·26 cites·17 claims
- 1957US4232110ASolid state devices formed by differential plasma etching of resistsBELL TELEPHONE LABOR INC·Filed 1979·Granted Nov 4, 1980·15 cites·34 claims
- 2055US4981770AProcess for fabrication of deviceAT & T BELL LAB·Filed 1989·Granted Jan 1, 1991·15 cites·14 claims
- 2155US4059340ADoped liquid crystal display deviceBELL TELEPHONE LABOR INC·Filed 1974·Granted Nov 22, 1977·9 cites·1 claims
- 2254US4225664AX-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate)BELL TELEPHONE LABOR INC·Filed 1979·Granted Sep 30, 1980·11 cites·26 claims
- 2353US7132214B2Polymers and photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2001·Granted Nov 7, 2006·3 cites·5 claims
- 2451US7220486B2Photoresist compositionsSHIPLEY CO LLC·Filed 2003·Granted May 22, 2007·3 cites·11 claims
- 2551US5206317AResist material and process for useDU PONT·Filed 1990·Granted Apr 27, 1993·10 cites·22 claims
- 2650US5508144AProcess for fabricating a deviceAT & T CORP·Filed 1995·Granted Apr 16, 1996·15 cites·22 claims
- 2744US6165674APolymers and photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 1998·Granted Dec 26, 2000·10 cites·22 claims
- 2843US6852466B2Photoresist compositions particularly suitable for short wavelength imagingSHIPLEY CO LLC·Filed 1998·Granted Feb 8, 2005·9 cites·9 claims
- 2940US7202009B2Polymers and photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2001·Granted Apr 10, 2007·0 cites·37 claims
- 3039US8012670B2Photoresist systemsROHM & HAAS ELECT MAT·Filed 2003·Granted Sep 6, 2011·0 cites·18 claims
- 3139US7019092B2Fluorinated copolymers for microlithographyDU PONT·Filed 2003·Granted Mar 28, 2006·0 cites·16 claims
- 3239US4500628AProcess of making solid state devices using silicon containing organometallic plasma developed resistsAT & T BELL LAB·Filed 1983·Granted Feb 19, 1985·6 cites·11 claims
- 3339US2002058199A1Novel polymers and photoresist compositions comprising electronegative groupsSHIPLEY CO LLC·Filed 2001·Application pending·0 cites
- 3438US6749986B2Polymers and photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2001·Granted Jun 15, 2004·2 cites·15 claims
- 3538US2003228474A1Photoresist compositionsSHIPLEY CO LLC·Filed 2003·Application pending·0 cites
- 3636US2003082477A1Photoresist compositionSHIPLEY CO LLC·Filed 2002·Application pending·0 cites
- 3732US6749983B1Polymers and photoresist compositionsSHIPLEY CO LLC·Filed 1999·Granted Jun 15, 2004·0 cites·9 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →