Inventor · disambiguated record
Todd Hylton
Also filed as: HYLTON TODD · HYLTON TODD L · HYLTON TODD LANIER
21 granted patents·4 pending applications·454 citations·filing 1993–2024
96Inventor score
Top patents by PatentIndex Score
25 records- 0195US5452163AMultilayer magnetoresistive sensorIBM·Filed 1993·Granted Sep 19, 1995·128 cites·89 claims
- 0293US6819871B1Multi-channel optical filter and multiplexer formed from stacks of thin-film layersWAVE INC 4·Filed 2001·Granted Nov 16, 2004·69 cites·22 claims
- 0387US6419803B1System and method for making thin-film structures using a stepped profile mask4WAVE INC·Filed 2001·Granted Jul 16, 2002·31 cites·8 claims
- 0482US9849588B2Apparatus and methods for remotely controlling robotic devicesBRAIN CORP·Filed 2014·Granted Dec 26, 2017·6 cites·22 claims
- 0582US6419802B1System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrateFiled 2001·Granted Jul 16, 2002·20 cites·13 claims
- 0681US6402905B1System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrateWAVE INC 4·Filed 2001·Granted Jun 11, 2002·21 cites·7 claims
- 0779US6679976B2System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals4WAVE INC·Filed 2002·Granted Jan 20, 2004·16 cites·25 claims
- 0878US6402904B1System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signalWAVE INC 4·Filed 2001·Granted Jun 11, 2002·14 cites·4 claims
- 0974US6016241AMagnetoresistive sensor utilizing a granular magnetoresistive layerIBM·Filed 1995·Granted Jan 18, 2000·36 cites·4 claims
- 1072US6723209B2System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicalsWAVE INC 4·Filed 2002·Granted Apr 20, 2004·12 cites·32 claims
- 1170US6610179B2System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a targetFiled 2001·Granted Aug 26, 2003·10 cites·3 claims
- 1269US5476680AMethod for manufacturing granular multilayer mangetoresistive sensorIBM·Filed 1995·Granted Dec 19, 1995·30 cites·17 claims
- 1367US6402900B1System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cubeWAVE INC 4·Filed 2001·Granted Jun 11, 2002·8 cites·12 claims
- 1466US6689255B2System and method for making thin-film structures using a stepped profile maskWAVE INC 4·Filed 2002·Granted Feb 10, 2004·6 cites·19 claims
- 1566US6402901B1System and method for performing sputter deposition using a spherical geometryWAVE INC 4·Filed 2001·Granted Jun 11, 2002·6 cites·20 claims
- 1661US6488821B2System and method for performing sputter deposition using a divergent ion beam source and a rotating substrateWAVE INC 4·Filed 2002·Granted Dec 3, 2002·4 cites·4 claims
- 1760US7316764B2System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signalWAVE INC 4·Filed 2004·Granted Jan 8, 2008·4 cites·5 claims
- 1860US6843891B2Apparatus for sputter depositionKAUFMAN & ROBINSON INC·Filed 2001·Granted Jan 18, 2005·4 cites·17 claims
- 1953US6682634B1Apparatus for sputter depositionKAUFMAN & ROBINSON INC·Filed 1999·Granted Jan 27, 2004·10 cites·1 claims
- 2052US2025036824A1Systems and methods for mobile data capture and 3d model constructionLIMAR AI INC·Filed 2024·Application pending·0 cites
- 2150US5492775ABarium ferrite thin film for longitudinal recordingIBM·Filed 1993·Granted Feb 20, 1996·13 cites·7 claims
- 2249US2022083858A1Thermodynamic neural networkUNIV CALIFORNIA·Filed 2019·Application pending·0 cites
- 2344US2002174832A1System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to an angular position of a rotating substrate4WAVE INC·Filed 2002·Application pending·0 cites
- 2440US2002130040A1System and method for performing sputter deposition using a devergent ion beam source and a rotating substrateWAVE INC 4·Filed 2001·Application pending·0 cites
- 2536US5629682AMagnetic recorder having MR read and inductive write capabilityIBM·Filed 1994·Granted May 13, 1997·6 cites·33 claims
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