Inventor · disambiguated record
Korehito Kato
Also filed as: KATO KOREHITO
14 granted patents·1 pending application·6 citations·filing 2015–2022
85Inventor score
Files withKANTO DENKA KOGYO KK15
Top patents by PatentIndex Score
15 records- 0175US10287499B2Etching gas composition for silicon compound, and etching methodKANTO DENKA KOGYO KK·Filed 2015·Granted May 14, 2019·2 cites·6 claims
- 0272US11814726B2Dry etching method or dry cleaning methodKANTO DENKA KOGYO KK·Filed 2022·Granted Nov 14, 2023·0 cites·12 claims
- 0371US11795396B2Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the sameKANTO DENKA KOGYO KK·Filed 2022·Granted Oct 24, 2023·0 cites·18 claims
- 0471US11584989B2Dry etching method or dry cleaning methodKANTO DENKA KOGYO KK·Filed 2018·Granted Feb 21, 2023·1 cites·16 claims
- 0568US11315797B2Plasma etching method using gas molecule containing sulfur atomKANTO DENKA KOGYO KK·Filed 2019·Granted Apr 26, 2022·1 cites·9 claims
- 0667US11434565B2Cleaning method of semiconductor manufacturing deviceKANTO DENKA KOGYO KK·Filed 2017·Granted Sep 6, 2022·1 cites·6 claims
- 0766US11795397B2Dry etching gas composition comprising sulfur-containing fluorocarbon compound and dry etching method using the sameKANTO DENKA KOGYO KK·Filed 2022·Granted Oct 24, 2023·0 cites·13 claims
- 0864US10899615B2Feeding process of chlorine fluorideKANTO DENKA KOGYO KK·Filed 2017·Granted Jan 26, 2021·1 cites·14 claims
- 0962US11814561B2Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the sameKANTO DENKA KOGYO KK·Filed 2019·Granted Nov 14, 2023·0 cites·10 claims
- 1056US12410112B2Purification method for fluoroolefin having structure of =CF2 or =CHF, high-purity fluoroolefin, and production method thereforKANTO DENKA KOGYO KK·Filed 2020·Granted Sep 9, 2025·0 cites·12 claims
- 1156US2021388264A1Dry etching gas composition comprising sulfur-containing fluorocarbon compound and dry etching method using the sameKANTO DENKA KOGYO KK·Filed 2019·Application pending·0 cites
- 1253US10431472B2Gas composition for dry etching and dry etching methodKANTO DENKA KOGYO KK·Filed 2018·Granted Oct 1, 2019·0 cites·13 claims
- 1350US10629449B2Gas composition for dry etching and dry etching methodKANTO DENKA KOGYO KK·Filed 2016·Granted Apr 21, 2020·0 cites·2 claims
- 1448US11183393B2Atomic layer etching using acid halideKANTO DENKA KOGYO KK·Filed 2018·Granted Nov 23, 2021·0 cites·7 claims
- 1543US11437244B2Dry etching gas composition and dry etching methodKANTO DENKA KOGYO KK·Filed 2018·Granted Sep 6, 2022·0 cites·20 claims
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