Inventor · disambiguated record
Shinya Tamonoki
Also filed as: TAMONOKI SHINYA
9 granted patents·4 pending applications·10 citations·filing 2010–2025
84Inventor score
Top patents by PatentIndex Score
13 records- 0187US9222962B2Automatic gain control apparatus, automatic gain control method, and receiverSONY CORP·Filed 2015·Granted Dec 29, 2015·4 cites·15 claims
- 0282US9608051B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2016·Granted Mar 28, 2017·1 cites·10 claims
- 0380US8513879B2Display apparatus, manufacturing method of display apparatus, and electronic deviceTAMONOKI SHINYA·Filed 2010·Granted Aug 20, 2013·3 cites·8 claims
- 0479US10872946B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2019·Granted Dec 22, 2020·0 cites·7 claims
- 0577US9461200B2Display apparatus, manufacturing method of display apparatus, and electronic deviceSONY CORP·Filed 2013·Granted Oct 4, 2016·1 cites·10 claims
- 0676US11257890B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2020·Granted Feb 22, 2022·0 cites·20 claims
- 0776US9954046B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2017·Granted Apr 24, 2018·1 cites·10 claims
- 0865US10522606B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2018·Granted Dec 31, 2019·0 cites·16 claims
- 0964US10096666B2Display apparatus, manufacturing method of display apparatus, and electronic deviceJOLED INC·Filed 2018·Granted Oct 9, 2018·0 cites·2 claims
- 1061US2024297054A1Substrate processing apparatus, substrate processing system, electrical power supply system, and electrical power supply methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1160US2024290577A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1260US2024222075A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1353US2025201601A1Plasma processing apparatus and temperature measurement methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →