Inventor · disambiguated record
Toshihisa Nozawa
Also filed as: NOZAWA TOSHIHISA
81 granted patents·52 pending applications·1,265 citations·filing 1990–2024
99Inventor score
Top patents by PatentIndex Score
133 records- 0199US9960033B1Method of depositing and etching Si-containing filmASM IP HOLDING BV·Filed 2016·Granted May 1, 2018·398 cites·19 claims
- 0296US10145014B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 4, 2018·17 cites·11 claims
- 0395US11476109B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2020·Granted Oct 18, 2022·4 cites·24 claims
- 0492US11929251B2Substrate processing apparatus having electrostatic chuck and substrate processing methodASM IP HOLDING BV·Filed 2020·Granted Mar 12, 2024·2 cites·11 claims
- 0591US11908684B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2022·Granted Feb 20, 2024·1 cites·20 claims
- 0691US10290523B2Wafer processing apparatus, recording medium and wafer conveying methodASM IP HOLDING BV·Filed 2017·Granted May 14, 2019·6 cites·16 claims
- 0789US5290381APlasma etching apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 1, 1994·116 cites·16 claims
- 0888US11482418B2Substrate processing method and apparatusASM IP HOLDING BV·Filed 2018·Granted Oct 25, 2022·4 cites·13 claims
- 0988US7396431B2Plasma processing system for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Granted Jul 8, 2008·50 cites·60 claims
- 1086US5539179AElectrostatic chuck having a multilayer structure for attracting an objectTOKYO ELECTRON LTD·Filed 1991·Granted Jul 23, 1996·96 cites·4 claims
- 1185US11643724B2Method of forming structures using a neutral beamASM IP HOLDING BV·Filed 2020·Granted May 9, 2023·1 cites·17 claims
- 1284US12129548B2Method of forming structures using a neutral beamASM IP HOLDING BV·Filed 2023·Granted Oct 29, 2024·0 cites·18 claims
- 1384US5250137APlasma treating apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Oct 5, 1993·87 cites·12 claims
- 1483US12272548B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2024·Granted Apr 8, 2025·0 cites·20 claims
- 1582US8973527B2Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatusNOZAWA TOSHIHISA·Filed 2009·Granted Mar 10, 2015·4 cites·5 claims
- 1682US7469654B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2003·Granted Dec 30, 2008·22 cites·42 claims
- 1782US5255153AElectrostatic chuck and plasma apparatus equipped therewithTOKYO ELECTRON LTD·Filed 1991·Granted Oct 19, 1993·78 cites·16 claims
- 1881US8925351B2Manufacturing method of top plate of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 6, 2015·5 cites·6 claims
- 1980US8323521B2Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniquesZHAO JIANPING·Filed 2010·Granted Dec 4, 2012·5 cites·20 claims
- 2080US5271788APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Dec 21, 1993·38 cites·19 claims
- 2180US5223113AApparatus for forming reduced pressure and for processing objectTOKYO ELECTRON LTD·Filed 1991·Granted Jun 29, 1993·74 cites·13 claims
- 2279US5234527ALiquid level detecting device and a processing apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Aug 10, 1993·39 cites·18 claims
- 2378US9574267B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 21, 2017·2 cites·5 claims
- 2477US9177846B2Placing bed structure, treating apparatus using the structure, and method for using the apparatusKAWAMURA KOHEI·Filed 2008·Granted Nov 3, 2015·5 cites·9 claims
- 2577US8915999B2Shower plate sintered integrally with gas release hole member and method for manufacturing the sameOKESAKU MASAHIRO·Filed 2007·Granted Dec 23, 2014·4 cites·5 claims
- 2677US8366869B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Feb 5, 2013·3 cites·11 claims
- 2777US5221403ASupport table for plate-like body and processing apparatus using the tableTOKYO ELECTRON LTD·Filed 1991·Granted Jun 22, 1993·60 cites·20 claims
- 2875US8967080B2Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing methodTIAN CAIZHONG·Filed 2009·Granted Mar 3, 2015·10 cites·8 claims
- 2975US8343308B2Ceiling plate and plasma process apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·4 cites·6 claims
- 3075US7874781B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Jan 25, 2011·17 cites·15 claims
- 3174US8815014B2Method and system for performing different deposition processes within a single chamberFAGUET JACQUES·Filed 2011·Granted Aug 26, 2014·3 cites·15 claims
- 3272US7930992B2Plasma processing equipmentTOKYO ELECTRON LTD·Filed 2004·Granted Apr 26, 2011·9 cites·13 claims
- 3370US8052887B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2010·Granted Nov 8, 2011·2 cites·5 claims
- 3469US8480848B2Plasma processing apparatusTIAN CAIZHONG·Filed 2006·Granted Jul 9, 2013·1 cites·8 claims
- 3569US7895971B2Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·3 cites·18 claims
- 3669US2023040728A1Substrate processing method and apparatusASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 3768US10388557B2Placing bed structure, treating apparatus using the structure, and method for using the apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 20, 2019·1 cites·12 claims
- 3868US8123194B2On-off valve and process apparatus employing the on-off valveNOZAWA TOSHIHISA·Filed 2008·Granted Feb 28, 2012·2 cites·6 claims
- 3967US9117764B2Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor elementMATSUOKA TAKAAKI·Filed 2011·Granted Aug 25, 2015·2 cites·5 claims
- 4067US8967082B2Plasma processing apparatus and gas supply device for plasma processing apparatusIWASAKI MASAHIDE·Filed 2010·Granted Mar 3, 2015·2 cites·12 claims
- 4166US8383519B2Etching method and recording mediumTOKYO ELECTRON LTD·Filed 2008·Granted Feb 26, 2013·4 cites·9 claims
- 4266US8173928B2Processing deviceNOZAWA TOSHIHISA·Filed 2007·Granted May 8, 2012·2 cites·9 claims
- 4365US10844489B2Film forming apparatus and shower headTOKYO ELECTRON LTD·Filed 2015·Granted Nov 24, 2020·1 cites·15 claims
- 4465US7828927B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2005·Granted Nov 9, 2010·1 cites·13 claims
- 4564US8974628B2Plasma treatment device and optical monitor deviceNOZAWA TOSHIHISA·Filed 2011·Granted Mar 10, 2015·2 cites·10 claims
- 4663US5147497APlasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is appliedTOKYO ELECTRON LTD·Filed 1991·Granted Sep 15, 1992·17 cites·14 claims
- 4762US8486792B2Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor deviceUEDA HIROKAZU·Filed 2009·Granted Jul 16, 2013·2 cites·27 claims
- 4860US9767994B2Shower plate sintered integrally with gas release hole member and method for manufacturing the sameTOKYO ELECTRON LTD·Filed 2014·Granted Sep 19, 2017·0 cites·10 claims
- 4960US5888846AMethod for microfabricating diamondKOBE STEEL LTD·Filed 1998·Granted Mar 30, 1999·23 cites·14 claims
- 5060US2010279512A1Plasma processing apparatus and method for plasma-processing semiconductor substrateTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
Showing the top 50 of 133 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →