Inventor · disambiguated record
Tatsumi Mizutani
Also filed as: MIZUTANI TATSUMI
26 granted patents·1 pending application·669 citations·filing 1980–2004
97Inventor score
Top patents by PatentIndex Score
27 records- 0198US5284544AApparatus for and method of surface treatment for microelectronic devicesHITACHI LTD·Filed 1990·Granted Feb 8, 1994·173 cites·53 claims
- 0285US4289188AMethod and apparatus for monitoring etchingHITACHI LTD·Filed 1980·Granted Sep 15, 1981·60 cites·12 claims
- 0384US5108778ASurface treatment methodHITACHI LTD·Filed 1990·Granted Apr 28, 1992·33 cites·25 claims
- 0480US6677244B2Specimen surface processing methodHITACHI LTD·Filed 2002·Granted Jan 13, 2004·18 cites·4 claims
- 0579US5140272AMethod of semiconductor surface measurment and an apparatus for realizing the sameHITACHI LTD·Filed 1988·Granted Aug 18, 1992·34 cites·8 claims
- 0675US6332425B1Surface treatment method and systemHITACHI LTD·Filed 2000·Granted Dec 25, 2001·16 cites·15 claims
- 0771US6767838B1Method and apparatus for treating surface of semiconductorHITACHI LTD·Filed 2000·Granted Jul 27, 2004·11 cites·9 claims
- 0871US6231777B1Surface treatment method and systemHITACHI LTD·Filed 1995·Granted May 15, 2001·34 cites·6 claims
- 0970US4412119AMethod for dry-etchingHITACHI LTD·Filed 1981·Granted Oct 25, 1983·32 cites·16 claims
- 1067US6660647B1Method for processing surface of sampleHITACHI LTD·Filed 1999·Granted Dec 9, 2003·28 cites·14 claims
- 1166US4308089AMethod for preventing corrosion of Al and Al alloysHITACHI LTD·Filed 1980·Granted Dec 29, 1981·27 cites·14 claims
- 1265US6849191B2Method and apparatus for treating surface of semiconductorHITACHI LTD·Filed 1999·Granted Feb 1, 2005·24 cites·6 claims
- 1363US5314839ASolid state device fabrication method including a surface treatment step with a neutral particle beam with an energy between 10ev and 100evHITACHI LTD·Filed 1991·Granted May 24, 1994·37 cites·45 claims
- 1462US5554257AMethod of treating surfaces with atomic or molecular beamHITACHI LTD·Filed 1994·Granted Sep 10, 1996·33 cites·19 claims
- 1560US5874013ASemiconductor integrated circuit arrangement fabrication methodHITACHI LTD·Filed 1997·Granted Feb 23, 1999·18 cites·99 claims
- 1656US5462635ASurface processing method and an apparatus for carrying out the sameHITACHI LTD·Filed 1994·Granted Oct 31, 1995·24 cites·3 claims
- 1754US6309980B1Semiconductor integrated circuit arrangement fabrication methodHITACHI LTD·Filed 2000·Granted Oct 30, 2001·4 cites·61 claims
- 1854US4511429AProcess for dry etching of aluminum and its alloyHITACHI LTD·Filed 1982·Granted Apr 16, 1985·20 cites·12 claims
- 1950US7259104B2Sample surface processing methodHITACHI LTD·Filed 2003·Granted Aug 21, 2007·2 cites·7 claims
- 2047US4352974APlasma etcher having isotropic subchamber with gas outlet for producing uniform etchingHITACHI LTD·Filed 1980·Granted Oct 5, 1982·14 cites·23 claims
- 2146US6074958ASemiconductor integrated circuit arrangement fabrication methodHITACHI LTD·Filed 1999·Granted Jun 13, 2000·9 cites·9 claims
- 2245US5962347ASemiconductor integrated circuit arrangement fabrication methodHITACHI LTD·Filed 1998·Granted Oct 5, 1999·8 cites·33 claims
- 2344US7049243B2Surface processing method of a specimen and surface processing apparatus of the specimenHITACHI LTD·Filed 2004·Granted May 23, 2006·0 cites·4 claims
- 2440US2002125207A1Plasma processing methodFiled 2002·Application pending·0 cites
- 2537USRE39895ESemiconductor integrated circuit arrangement fabrication methodRENESAS TECH CORP·Filed 2002·Granted Oct 23, 2007·0 cites·35 claims
- 2637US6492277B1Specimen surface processing method and apparatusHITACHI LTD·Filed 1999·Granted Dec 10, 2002·4 cites·17 claims
- 2734US5241186ASurface treatment method and apparatus thereforHITACHI LTD·Filed 1990·Granted Aug 31, 1993·6 cites·68 claims
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