Inventor · disambiguated record
Yukiko Nishioka
Also filed as: NISHIOKA YUKIKO
12 granted patents·4 pending applications·393 citations·filing 1993–2010
92Inventor score
Top patents by PatentIndex Score
16 records- 0193US5603961ASustained release multi-core microsphere preparation and method for producing the sameTANABE SEIYAKU CO·Filed 1993·Granted Feb 18, 1997·95 cites·14 claims
- 0292US7285492B2Method for processing substrateEBARA CORP·Filed 2005·Granted Oct 23, 2007·21 cites·9 claims
- 0385US5556642AMethod for producing sustained release microsphere preparationTANABE SEIYAKU CO·Filed 1993·Granted Sep 17, 1996·90 cites·6 claims
- 0483US5549874ADischarge reactorEBARA CORP·Filed 1993·Granted Aug 27, 1996·59 cites·5 claims
- 0580US5538695AOzonizerEBARA CORP·Filed 1993·Granted Jul 23, 1996·34 cites·8 claims
- 0678US5488842AMethod for deodorizing and refreshing for dry cleaning and dry cleaning apparatus using such methodEBARA CORP·Filed 1994·Granted Feb 6, 1996·34 cites·7 claims
- 0771US5511264AMethod for deodorizing and refreshing for dry cleaningEBARA CORP·Filed 1995·Granted Apr 30, 1996·26 cites·5 claims
- 0864US5688289AMethod of laundering clothes and textilesEBARA CORP·Filed 1996·Granted Nov 18, 1997·25 cites·15 claims
- 0957US6932946B2Ozone generatorEBARA CORP·Filed 2001·Granted Aug 23, 2005·3 cites·11 claims
- 1054US7155963B2Cleaning evaluation method for a substrateEBARA CORP·Filed 2004·Granted Jan 2, 2007·6 cites·6 claims
- 1152US2008000776A1Method and apparatus for processing substrateWANG XINMING·Filed 2007·Application pending·0 cites
- 1245US2010105154A1Method and apparatus for processing substrateWANG XINMING·Filed 2010·Application pending·0 cites
- 1340US2008000509A1Cleaning apparatus and cleaning methodYONEKURA RYOSUKE·Filed 2007·Application pending·0 cites
- 1436US7264681B2Cleaning apparatus and cleaning methodEBARA CORP·Filed 2003·Granted Sep 4, 2007·0 cites·5 claims
- 1536US7077730B2Method and apparatus for polishing a workpieceEBARA CORP·Filed 2004·Granted Jul 18, 2006·0 cites·19 claims
- 1633US2005252535A1Substrate cleaning apparatus and methodNISHIOKA YUKIKO·Filed 2004·Application pending·0 cites
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