Inventor · disambiguated record
Christian Marinus Leewis
Also filed as: LEEWIS CHRISTIAN MARINUS
10 granted patents·3 pending applications·30 citations·filing 2009–2019
84Inventor score
Files withASML NETHERLANDS BV7LEEWIS CHRISTIAN MARINUS2MEGENS HENRICUS JOHANNES LAMBERTUS2MEESSEN HIERONYMUS JOHANNUS CHRISTIAAN1QUAEDACKERS JOHANNES ANNA1
Top patents by PatentIndex Score
13 records- 0192US9594299B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 14, 2017·13 cites·33 claims
- 0288US9436099B2Lithographic focus and dose measurement using a 2-D targetASML NETHERLANDS BV·Filed 2014·Granted Sep 6, 2016·5 cites·11 claims
- 0385US8891061B2Lithographic focus and dose measurement using a 2-D targetLEEWIS CHRISTIAN MARINUS·Filed 2009·Granted Nov 18, 2014·10 cites·18 claims
- 0473US9939735B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 10, 2018·1 cites·20 claims
- 0563US10871716B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2019·Granted Dec 22, 2020·0 cites·21 claims
- 0657US10394132B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·0 cites·20 claims
- 0755US2014199634A1Method of Measuring a CharacteristicASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 0854US8502955B2Method of determining a characteristicMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2009·Granted Aug 6, 2013·1 cites·12 claims
- 0951US8848195B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrateLEEWIS CHRISTIAN MARINUS·Filed 2009·Granted Sep 30, 2014·0 cites·24 claims
- 1044US8685626B2Method of measuring a characteristicQUAEDACKERS JOHANNES ANNA·Filed 2010·Granted Apr 1, 2014·0 cites·12 claims
- 1143US8982328B2Method and apparatus for overlay measurementMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2010·Granted Mar 17, 2015·0 cites·18 claims
- 1241US2011295555A1Method and System for Determining a Lithographic Process ParameterMEESSEN HIERONYMUS JOHANNUS CHRISTIAAN·Filed 2009·Application pending·0 cites
- 1333US2010328636A1Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →