Inventor · disambiguated record
Sergei Sokolov
Also filed as: PODBORONOV BORIS P · SOKOLOV SERGEI · SOKOLOV SERGEI S
11 granted patents·4 pending applications·8 citations·filing 1978–2023
81Inventor score
Top patents by PatentIndex Score
15 records- 0186US10831107B2Method for of measuring a parameter relating to a structure formed using a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Nov 10, 2020·3 cites·20 claims
- 0275US11150563B2Method of measuring a parameter of a patterning process, metrology apparatus, targetASML NETHERLANDS BV·Filed 2019·Granted Oct 19, 2021·1 cites·21 claims
- 0374US11181828B2Method of determining a value of a parameter of interest of a patterning process, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Nov 23, 2021·2 cites·20 claims
- 0467US12287591B2Lithographic apparatus, metrology systems, and methods thereofASML NETHERLANDS BV·Filed 2021·Granted Apr 29, 2025·0 cites·20 claims
- 0561US11762305B2Alignment methodASML NETHERLANDS BV·Filed 2020·Granted Sep 19, 2023·0 cites·15 claims
- 0661US2025341781A1Passive integrated optical systems and methods for reduction of spatial optical coherenceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0760US2025036031A1Target asymmetry measurement for substrate alignment in lithography systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0856US11703771B2Variable diffraction gratingASML HOLDING NV·Filed 2020·Granted Jul 18, 2023·0 cites·17 claims
- 0955US11474435B2Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameterASML NETHERLANDS BV·Filed 2019·Granted Oct 18, 2022·0 cites·18 claims
- 1055US10788757B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2019·Granted Sep 29, 2020·0 cites·20 claims
- 1155US2024027913A1Metrology system and coherence adjustersASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1253US11022899B2Method of measuring a focus parameter relating to a structure formed using a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Jun 1, 2021·0 cites·13 claims
- 1347US2024160151A1Digital holographic microscope and associated metrology methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1427US4190776AMultipoint measuring deviceFURMAN ANATOLY V·Filed 1978·Granted Feb 26, 1980·2 cites·1 claims
- 1513US4301402AElectrical measuring circuitGALKIN MIKHAIL M·Filed 1979·Granted Nov 17, 1981·0 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →