Inventor · disambiguated record
Kenichi Koyanagi
Also filed as: KOYANAGI KENICHI
25 granted patents·11 pending applications·367 citations·filing 1996–2015
96Inventor score
Top patents by PatentIndex Score
36 records- 0194US8880216B2Picking systemIZUMI TETSURO·Filed 2011·Granted Nov 4, 2014·28 cites·5 claims
- 0289US6191002B1Method of forming trench isolation structureNEC CORP·Filed 1999·Granted Feb 20, 2001·105 cites·7 claims
- 0388US7771535B2Semiconductor manufacturing apparatusELPIDA MEMORY INC·Filed 2006·Granted Aug 10, 2010·8 cites·12 claims
- 0485US8546236B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Oct 1, 2013·5 cites·19 claims
- 0584US8574998B2Leakage reduction in DRAM MIM capacitorsMALHOTRA SANDRA·Filed 2011·Granted Nov 5, 2013·7 cites·15 claims
- 0683US8415227B2High performance dielectric stack for DRAM capacitorMALHOTRA SANDRA·Filed 2011·Granted Apr 9, 2013·5 cites·10 claims
- 0783US7256144B2Method for forming a metal oxide filmELPIDA MEMORY INC·Filed 2004·Granted Aug 14, 2007·24 cites·24 claims
- 0880US8606400B2Robot systemIZUMI TETSURO·Filed 2012·Granted Dec 10, 2013·5 cites·17 claims
- 0979US8476141B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Jul 2, 2013·3 cites·9 claims
- 1078US8541283B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Sep 24, 2013·3 cites·20 claims
- 1176US6033990AMethod for manufacturing a multilevel interconnection structureNEC CORP·Filed 1998·Granted Mar 7, 2000·46 cites·14 claims
- 1275US7576016B2Process for manufacturing semiconductor deviceELPIDA MEMORY INC·Filed 2007·Granted Aug 18, 2009·5 cites·9 claims
- 1375US6346302B2High density plasma enhanced chemical vapor deposition methodNEC CORP·Filed 1998·Granted Feb 12, 2002·46 cites·7 claims
- 1473US6005291ASemiconductor device and process for production thereofNEC CORP·Filed 1998·Granted Dec 21, 1999·42 cites·15 claims
- 1571US9178006B2Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applicationsINTERMOLECULAR INC·Filed 2014·Granted Nov 3, 2015·3 cites·16 claims
- 1671US8880217B2Picking systemIZUMI TETSURO·Filed 2011·Granted Nov 4, 2014·5 cites·18 claims
- 1765US6509200B2Method of appraising a dielectric film, method of calibrating temperature of a heat treatment device, and method of fabricating a semiconductor memory deviceNEC CORP·Filed 2002·Granted Jan 21, 2003·9 cites·19 claims
- 1863US7741173B2Method for forming a metal oxide filmELPIDA MEMORY INC·Filed 2007·Granted Jun 22, 2010·1 cites·18 claims
- 1951US2013069202A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2051US2013071991A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2150US7224016B2Memory with memory cells that include a MIM type capacitor with a lower electrode made for reduced resistance at an interface with a metal filmHITACHI LTD·Filed 2004·Granted May 29, 2007·3 cites·12 claims
- 2249US6939760B2Method for semiconductor device manufacturing to include multistage chemical vapor deposition of material oxide filmELPIDA MEMORY INC·Filed 2003·Granted Sep 6, 2005·2 cites·35 claims
- 2348US2007148896A1Memory with memory cells that include a mim type capacitor with a lower electrode made for reduced resistance at an interface with a metal filmHITACHI LTD·Filed 2006·Application pending·0 cites
- 2447US2012235276A1Electrode treatments for enhanced dram performanceRUI XIANGXIN·Filed 2011·Application pending·0 cites
- 2543US2008066677A1Semiconductor manufacturing systemMOROZUMI YUICHIRO·Filed 2007·Application pending·0 cites
- 2642US2013034660A1Painting system and opening/closing hand of door opening/closing robotYASKAWA DENKI SEISAKUSHO KK·Filed 2011·Application pending·0 cites
- 2741US7763500B2Method for manufacturing semiconductor storage device comprising a slow cooling stepELPIDA MEMORY INC·Filed 2006·Granted Jul 27, 2010·0 cites·17 claims
- 2839US8277891B2Method for suppressing particle generation during semiconductor manufacturingMOROZUMI YUICHIRO·Filed 2010·Granted Oct 2, 2012·0 cites·8 claims
- 2939US7303973B2ALD process for capacitor dielectricELPIDA MEMORY INC·Filed 2003·Granted Dec 4, 2007·0 cites·34 claims
- 3038US6187693B1Heat treatment of a tantalum oxide filmNEC CORP·Filed 1999·Granted Feb 13, 2001·6 cites·14 claims
- 3138US5891234ASpin on glass material and method for forming a semiconductor device by using improved spin on glass materialNEC CORP·Filed 1996·Granted Apr 6, 1999·6 cites·18 claims
- 3238US2013285202A1Semiconductor deviceELPIDA MEMORY INC·Filed 2013·Application pending·0 cites
- 3336US2001016394A1Manufacturing method of semiconductor device having tantalum oxide filmFiled 2001·Application pending·0 cites
- 3434US2015134110A1Robot system and article transfer methodYASKAWA DENKI SEISAKUSHO KK·Filed 2015·Application pending·0 cites
- 3534US2015151430A1Robot system and article transfer methodYASKAWA DENKI SEISAKUSHO KK·Filed 2015·Application pending·0 cites
- 3631US2015127148A1Robot system and article transfer methodYASKAWA DENKI SEISAKUSHO KK·Filed 2015·Application pending·0 cites
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