Inventor · disambiguated record
Yoshika Sakai
Also filed as: SAKAI YOSHIKA
11 granted patents·214 citations·filing 1996–1998
92Inventor score
Files withTOKYO OHKA KOGYO CO LTD11
Top patents by PatentIndex Score
11 records- 0185US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 0275US5908730AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·35 cites·19 claims
- 0375US5817444APositive-working photoresist composition and multilayered resist material using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 6, 1998·35 cites·21 claims
- 0461US5955240APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 21, 1999·23 cites·9 claims
- 0560US5948589APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 7, 1999·20 cites·8 claims
- 0659US5770343APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 23, 1998·15 cites·9 claims
- 0757US6159652APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 12, 2000·12 cites·4 claims
- 0848US5945248AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Aug 31, 1999·14 cites·9 claims
- 0948US5874195APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 23, 1999·9 cites·7 claims
- 1037US5854357AProcess for the production of polyhydroxstyreneTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 29, 1998·3 cites·5 claims
- 1132US5856058AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jan 5, 1999·2 cites·48 claims
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