Inventor · disambiguated record
Robert Jay Rafac
Also filed as: RAFAC ROBERT · RAFAC ROBERT J · RAFAC ROBERT JAY
50 granted patents·7 pending applications·269 citations·filing 2003–2025
98Inventor score
Top patents by PatentIndex Score
57 records- 0196US9426872B1System and method for controlling source laser firing in an LPP EUV light sourceASML NETHERLANDS BV·Filed 2015·Granted Aug 23, 2016·9 cites·20 claims
- 0296US8680495B1Extreme ultraviolet light sourceCYMER INC·Filed 2013·Granted Mar 25, 2014·17 cites·18 claims
- 0395US8791440B1Target for extreme ultraviolet light sourceCYMER INC·Filed 2013·Granted Jul 29, 2014·25 cites·29 claims
- 0494US9820368B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Nov 14, 2017·5 cites·46 claims
- 0594US9713240B2Stabilizing EUV light power in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Jul 18, 2017·7 cites·20 claims
- 0694US8872143B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2013·Granted Oct 28, 2014·23 cites·26 claims
- 0793US9232623B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Jan 5, 2016·8 cites·28 claims
- 0892US9832852B1EUV LPP source with dose control and laser stabilization using variable width laser pulsesASML NETHERLANDS BV·Filed 2016·Granted Nov 28, 2017·6 cites·21 claims
- 0992US8927952B2Target for laser produced plasma extreme ultraviolet light sourceCymer LLC·Filed 2014·Granted Jan 6, 2015·6 cites·21 claims
- 1090US11096266B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2020·Granted Aug 17, 2021·2 cites·20 claims
- 1190US8014432B2Regenerative ring resonatorCYMER INC·Filed 2010·Granted Sep 6, 2011·12 cites·29 claims
- 1289US9980359B2Systems and methods for controlling EUV energy generation using pulse intensityASML NETHERLANDS BV·Filed 2015·Granted May 22, 2018·4 cites·14 claims
- 1389US7088758B2Relax gas discharge laser lithography light sourceCYMER INC·Filed 2004·Granted Aug 8, 2006·33 cites·109 claims
- 1488US11266002B2System for monitoring a plasmaASML NETHERLANDS BV·Filed 2018·Granted Mar 1, 2022·3 cites·29 claims
- 1587US8624209B1Controlling spatial properties in an excimer ring amplifierCYMER INC·Filed 2013·Granted Jan 7, 2014·12 cites·23 claims
- 1686US10314153B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2017·Granted Jun 4, 2019·2 cites·32 claims
- 1786US9462668B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Oct 4, 2016·3 cites·26 claims
- 1885US9232624B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Jan 5, 2016·2 cites·20 claims
- 1984US10401704B2Compensating for a physical effect in an optical systemASML NETHERLANDS BV·Filed 2016·Granted Sep 3, 2019·2 cites·29 claims
- 2084US8866110B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Oct 21, 2014·5 cites·20 claims
- 2184US8520186B2Active spectral control of optical sourceSEONG NAKGEUON·Filed 2010·Granted Aug 27, 2013·11 cites·20 claims
- 2283US10667377B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted May 26, 2020·2 cites·22 claims
- 2383US8563956B1Intracavity loss element for power amplifierCYMER INC·Filed 2012·Granted Oct 22, 2013·6 cites·18 claims
- 2482US9239269B1Calibration of photoelectromagnetic sensor in a laser sourceASML NETHERLANDS BV·Filed 2014·Granted Jan 19, 2016·6 cites·11 claims
- 2581US10674591B2Target expansion rate control in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2019·Granted Jun 2, 2020·1 cites·27 claims
- 2680US9516729B2Variable radius mirror dichroic beam splitter module for extreme ultraviolet sourceASML NETHERLANDS BV·Filed 2015·Granted Dec 6, 2016·3 cites·20 claims
- 2780USRE45957ERegenerative ring resonatorCymer LLC·Filed 2013·Granted Mar 29, 2016·4 cites·38 claims
- 2880US7317536B2Spectral bandwidth metrology for high repetition rate gas discharge lasersCYMER INC·Filed 2005·Granted Jan 8, 2008·10 cites·60 claims
- 2979US11758639B2Determining moving properties of a target in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2020·Granted Sep 12, 2023·1 cites·34 claims
- 3079US2025318038A1Laser system for source material conditioning in an euv light sourceASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 3178US9000403B2System and method for adjusting seed laser pulse width to control EUV output energyCYMER INC·Filed 2013·Granted Apr 7, 2015·3 cites·18 claims
- 3278US7639364B2Methods and apparatus for bandwidth measurement and bandwidth parameter calculation for laser lightCYMER INC·Filed 2007·Granted Dec 29, 2009·7 cites·25 claims
- 3375US10349509B2Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2018·Granted Jul 9, 2019·1 cites·17 claims
- 3475US7684046B2Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser lightCYMER INC·Filed 2007·Granted Mar 23, 2010·6 cites·24 claims
- 3574US2024419083A1Laser system for target metrology and alteration in an euv light sourceASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 3668US12238848B2EUV light source target metrologyASML NETHERLANDS BV·Filed 2021·Granted Feb 25, 2025·0 cites·20 claims
- 3767US9239268B1Calibration of photoelectromagnetic sensor in a laser sourceASML NETHERLANDS BV·Filed 2014·Granted Jan 19, 2016·2 cites·13 claims
- 3866US12171053B2System for monitoring a plasmaASML NETHERLANDS BV·Filed 2022·Granted Dec 17, 2024·0 cites·20 claims
- 3966US10904993B2Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2019·Granted Jan 26, 2021·0 cites·20 claims
- 4066US9709897B2Polarization control of pulsed light beamCymer LLC·Filed 2015·Granted Jul 18, 2017·1 cites·23 claims
- 4164US12078934B2Laser system for target metrology and alteration in an EUV light sourceASML NETHERLANDS BV·Filed 2019·Granted Sep 3, 2024·0 cites·3 claims
- 4263US7304748B2Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser lightCYMER INC·Filed 2004·Granted Dec 4, 2007·9 cites·93 claims
- 4361US7733494B2Bandwidth measuring device for high pulse repetition rate pulsed laserCYMER INC·Filed 2006·Granted Jun 8, 2010·3 cites·37 claims
- 4458US12369244B2Laser system for source material conditioning in an EUV light sourceASML NETHERLANDS BV·Filed 2020·Granted Jul 22, 2025·0 cites·21 claims
- 4558US9155179B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Oct 6, 2015·0 cites·31 claims
- 4658US7256893B2Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laserCYMER INC·Filed 2003·Granted Aug 14, 2007·6 cites·72 claims
- 4756US9107279B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Aug 11, 2015·0 cites·23 claims
- 4855US8912514B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Dec 16, 2014·0 cites·20 claims
- 4954US2017311429A1Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
- 5052US8853657B2Intracavity loss element for power amplifierRAFAC ROBERT J·Filed 2012·Granted Oct 7, 2014·1 cites·22 claims
Showing the top 50 of 57 patent records by PatentIndex Score.
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