Inventor · disambiguated record
Yih-Chen Su
Also filed as: SU YIH-CHEN
7 granted patents·3 pending applications·11 citations·filing 2003–2021
78Inventor score
Top patents by PatentIndex Score
10 records- 0187US11029593B2Lithography mask with a black border regions and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 8, 2021·2 cites·20 claims
- 0287US8916482B2Method of making a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Dec 23, 2014·5 cites·12 claims
- 0386US10866504B2Lithography mask with a black border region and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·2 cites·20 claims
- 0478US11048158B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 29, 2021·2 cites·20 claims
- 0575US11852966B2Lithography mask with a black border regions and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 0667US11906897B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 20, 2024·0 cites·20 claims
- 0749US2007012336A1Photomask cleaning using vacuum ultraviolet (VUV) light cleaningTAIWAN SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
- 0846US2009258159A1Novel treatment for mask surface chemical reductionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 0940US2007012335A1Photomask cleaning using vacuum ultraviolet (VUV) light cleaningCHANG HSIAO C·Filed 2005·Application pending·0 cites
- 1035US6962878B2Method to reduce photoresist mask line dimensionsTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Nov 8, 2005·0 cites·19 claims
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