Inventor · disambiguated record
Masashi Iwara
Also filed as: IWARA MASASHI
9 granted patents·2 pending applications·7 citations·filing 2014–2016
78Inventor score
Files withSUMITOMO METAL MINING CO11
Top patents by PatentIndex Score
11 records- 0179US9941415B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Apr 10, 2018·3 cites·9 claims
- 0273US10000842B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 19, 2018·2 cites·5 claims
- 0373US9670578B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·2 cites·10 claims
- 0451US10559823B2Manganese nickel composite hydroxide and method for producing same, lithium manganese nickel composite oxide and method for producing same, and nonaqueous electrolyte secondary batterySUMITOMO METAL MINING CO·Filed 2016·Granted Feb 11, 2020·0 cites·8 claims
- 0550US9732004B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Aug 15, 2017·0 cites·9 claims
- 0650US9688580B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 27, 2017·0 cites·9 claims
- 0749US9768316B2Oxide semiconductor thin film and thin film transistorSUMITOMO METAL MINING CO·Filed 2014·Granted Sep 19, 2017·0 cites·7 claims
- 0847US9543447B2Oxynitride semiconductor thin filmSUMITOMO METAL MINING CO·Filed 2014·Granted Jan 10, 2017·0 cites·7 claims
- 0944US2017077243A1Sintered oxide, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 1044US2017076943A1Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 1137US9670577B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·0 cites·10 claims
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