Inventor · disambiguated record
Hiromasa Mochiki
Also filed as: MOCHIKI HIROMASA
10 granted patents·3 pending applications·274 citations·filing 2004–2024
90Inventor score
Top patents by PatentIndex Score
13 records- 0197US8383001B2Plasma etching method, plasma etching apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2010·Granted Feb 26, 2013·60 cites·16 claims
- 0296US9496150B2Etching processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Nov 15, 2016·40 cites·21 claims
- 0396US8641916B2Plasma etching apparatus, plasma etching method and storage mediumYATSUDA KOICHI·Filed 2010·Granted Feb 4, 2014·67 cites·19 claims
- 0494US8685267B2Substrate processing methodYATSUDA KOICHI·Filed 2011·Granted Apr 1, 2014·43 cites·15 claims
- 0593US9373521B2Etching processing methodMOCHIKI HIROMASA·Filed 2010·Granted Jun 21, 2016·35 cites·23 claims
- 0689US7829469B2Method and system for uniformity control in ballistic electron beam enhanced plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Nov 9, 2010·13 cites·16 claims
- 0764US7172969B2Method and system for etching a film stackIBM·Filed 2004·Granted Feb 6, 2007·13 cites·28 claims
- 0861US9136097B2Shower plate and substrate processing apparatusKOSHIMIZU CHISHIO·Filed 2008·Granted Sep 15, 2015·1 cites·14 claims
- 0959US7723236B2Gas setting method, gas setting apparatus, etching apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2006·Granted May 25, 2010·1 cites·5 claims
- 1059US2025293095A1System and method of pulse scoringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1144US7709397B2Method and system for etching a high-k dielectric materialTOKYO ELECTRON LTD·Filed 2004·Granted May 4, 2010·1 cites·12 claims
- 1236US2006049139A1Method and system for etching a gate stackIBM·Filed 2004·Application pending·0 cites
- 1335US2015194441A1Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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