Inventor · disambiguated record
Stephen Hsu
Also filed as: HSU STEPHEN · HSU STEPHEN D · HSU STEPHEN DUAN-FU
11 granted patents·294 citations·filing 2001–2007
92Inventor score
Files withASML MASKTOOLS BV11
Top patents by PatentIndex Score
11 records- 0193US7247574B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jul 24, 2007·47 cites·22 claims
- 0291US7725872B2Orientation dependent shielding for use with dipole illumination techniquesASML MASKTOOLS BV·Filed 2007·Granted May 25, 2010·13 cites·18 claims
- 0391US6519760B2Method and apparatus for minimizing optical proximity effectsASML MASKTOOLS BV·Filed 2001·Granted Feb 11, 2003·61 cites·13 claims
- 0489US7523438B2Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2005·Granted Apr 21, 2009·15 cites·10 claims
- 0589US7246342B2Orientation dependent shielding for use with dipole illumination techniquesASML MASKTOOLS BV·Filed 2003·Granted Jul 17, 2007·33 cites·26 claims
- 0689US6851103B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2003·Granted Feb 1, 2005·44 cites·18 claims
- 0787US7774736B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2007·Granted Aug 10, 2010·8 cites·20 claims
- 0885US6915505B2Method and apparatus for performing rule-based gate shrink utilizing dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Jul 5, 2005·34 cites·23 claims
- 0978US7549140B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2005·Granted Jun 16, 2009·5 cites·13 claims
- 1078US7514183B2Method for performing transmission tuning of a mask pattern to improve process latitudeASML MASKTOOLS BV·Filed 2004·Granted Apr 7, 2009·16 cites·12 claims
- 1177US6951701B2Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2002·Granted Oct 4, 2005·18 cites·11 claims
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