Inventor · disambiguated record
Yoong-Hee Na
Also filed as: NA YOONG HEE
14 granted patents·1 pending application·4 citations·filing 2013–2021
84Inventor score
Top patents by PatentIndex Score
15 records- 0179US11092890B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Aug 17, 2021·2 cites·17 claims
- 0271US11092889B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 17, 2021·1 cites·16 claims
- 0371US10106687B2Composition for forming silica layer, method for manufacturing silica layer and silica layerSAMSUNG SDI CO LTD·Filed 2016·Granted Oct 23, 2018·1 cites·12 claims
- 0461US11789362B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Oct 17, 2023·0 cites·10 claims
- 0561US11789361B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Oct 17, 2023·0 cites·10 claims
- 0651US9362030B2Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerPARK EUN-SU·Filed 2014·Granted Jun 7, 2016·0 cites·8 claims
- 0750US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 0848US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 0946US11073761B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Jul 27, 2021·0 cites·20 claims
- 1044US10427944B2Composition for forming a silica based layer, silica based layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2015·Granted Oct 1, 2019·0 cites·16 claims
- 1143US9574108B2Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerPARK EUN-SU·Filed 2014·Granted Feb 21, 2017·0 cites·11 claims
- 1239US10020185B2Composition for forming silica layer, silica layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·16 claims
- 1339US2020041901A1Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Application pending·0 cites
- 1437US9240443B2Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agentBAE JIN-HEE·Filed 2013·Granted Jan 19, 2016·0 cites·16 claims
- 1536US9312122B2Rinse liquid for insulating film and method of rinsing insulating filmBAE JIN-HEE·Filed 2013·Granted Apr 12, 2016·0 cites·11 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →